Dopant induced ablation of poly(methyl methacrylate) at 308 nm

Poly(methyl methacrylate) (PMMA) is highly resistant to laser ablation at 308 nm. Either very high fluences or absorbing dopants must be used to ablate PMMA efficiently at this wavelength. We investigate two dopants, pyrene and a common solvent, chlorobenzene, using time-of-flight mass spectroscopy....

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of Applied Physics 1999-02, Vol.85 (3), p.1838-1847
Hauptverfasser:	Lippert, T., Webb, R. L., Langford, S. C., Dickinson, J. T.
Format:	Artikel
Sprache:	eng
Schlagworte:	ABLATION ABSORPTION SPECTRA DOPED MATERIALS EVAPORATION MASS SPECTRA MATERIALS SCIENCE PMMA POLYMERS RADICALS ULTRAVIOLET RADIATION
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!