Narrow band gap (1eV) InGaAsSbN solar cells grown by metalorganic vapor phase epitaxy

Heterojunction solar cell structures employing InGaAsSbN (Eg ∼ 1eV) base regions are grown lattice-matched to GaAs substrates using metalorganic vapor phase epitaxy. Room temperature (RT) photoluminescence (PL) measurements indicate a peak spectral emission at 1.04eV and carrier lifetimes of 471-576...

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Veröffentlicht in:Applied physics letters 2012-03, Vol.100 (12), p.121120-121120-4
Hauptverfasser: Kim, T. W., Garrod, T. J., Kim, K., Lee, J. J., LaLumondiere, S. D., Sin, Y., Lotshaw, W. T., Moss, S. C., Kuech, T. F., Tatavarti, Rao, Mawst, L. J.
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container_end_page 121120-4
container_issue 12
container_start_page 121120
container_title Applied physics letters
container_volume 100
creator Kim, T. W.
Garrod, T. J.
Kim, K.
Lee, J. J.
LaLumondiere, S. D.
Sin, Y.
Lotshaw, W. T.
Moss, S. C.
Kuech, T. F.
Tatavarti, Rao
Mawst, L. J.
description Heterojunction solar cell structures employing InGaAsSbN (Eg ∼ 1eV) base regions are grown lattice-matched to GaAs substrates using metalorganic vapor phase epitaxy. Room temperature (RT) photoluminescence (PL) measurements indicate a peak spectral emission at 1.04eV and carrier lifetimes of 471-576 ps are measured at RT from these structures using time-resolved PL techniques. Fabricated devices without anti-reflection coating demonstrate a peak efficiency of 4.58% under AM1.5 direct illumination. Solar cells with a 250nm-thick InGaAsSbN base layer exhibit a 17% improvement in open circuit voltage (V oc ), 14% improvement in fill factor, and 12% improvement in efficiency over the cells with a thicker (500nm-thick) base layer.
doi_str_mv 10.1063/1.3693160
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title Narrow band gap (1eV) InGaAsSbN solar cells grown by metalorganic vapor phase epitaxy
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