Growth of metal oxide thin films by laser-induced metalorganic chemical vapor deposition
The growth of metal oxide thin films by laser-induced metalorganic chemical vapor deposition was investigated by changing wavelength, power, repetition rate, and irradiation angle of the excimer laser. When O2 was used as an oxidizing gas with 193 or 248 nm irradiation, amorphous TiO2 and crystallin...
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| Veröffentlicht in: | Journal of applied physics 1996-12, Vol.80 (12), p.7073-7083 |
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| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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