Analytic model of power deposition in inductively coupled plasma sources
A simple analytic model valid for all collisionality regimes is developed to describe the power deposition in a cylindrical inductively coupled plasma source with a planar coil. The heating is ohmic at high pressures and remains finite at low pressures. The low-pressure collisionless heating is due...
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| Veröffentlicht in: | Journal of Applied Physics 1995-08, Vol.78 (3), p.1446-1458 |
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| container_end_page | 1458 |
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| container_issue | 3 |
| container_start_page | 1446 |
| container_title | Journal of Applied Physics |
| container_volume | 78 |
| creator | Vahedi, V. Lieberman, M. A. DiPeso, G. Rognlien, T. D. Hewett, D. |
| description | A simple analytic model valid for all collisionality regimes is developed to describe the power deposition in a cylindrical inductively coupled plasma source with a planar coil. The heating is ohmic at high pressures and remains finite at low pressures. The low-pressure collisionless heating is due to kinetic nonlocal effects. The model is in good agreement with other calculations of collisionless heating. A diffusion model is then used to determine the plasma density profile and the electron temperature in terms of the gas pressure and the source geometry. The heating and diffusion models are used to determine the scaling of the inductive electric field with applied frequency and input power, and the results are compared with published experimental data to verify the scaling. |
| doi_str_mv | 10.1063/1.360723 |
| format | Article |
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A.</creatorcontrib><creatorcontrib>DiPeso, G.</creatorcontrib><creatorcontrib>Rognlien, T. D.</creatorcontrib><creatorcontrib>Hewett, D.</creatorcontrib><title>Analytic model of power deposition in inductively coupled plasma sources</title><title>Journal of Applied Physics</title><description>A simple analytic model valid for all collisionality regimes is developed to describe the power deposition in a cylindrical inductively coupled plasma source with a planar coil. The heating is ohmic at high pressures and remains finite at low pressures. The low-pressure collisionless heating is due to kinetic nonlocal effects. The model is in good agreement with other calculations of collisionless heating. A diffusion model is then used to determine the plasma density profile and the electron temperature in terms of the gas pressure and the source geometry. The heating and diffusion models are used to determine the scaling of the inductive electric field with applied frequency and input power, and the results are compared with published experimental data to verify the scaling.</description><subject>70 PLASMA PHYSICS AND FUSION</subject><subject>COLLISIONLESS PLASMA</subject><subject>DIFFUSION</subject><subject>ELECTRON TEMPERATURE</subject><subject>ENERGY DEPOSITION</subject><subject>MATHEMATICAL MODELS</subject><subject>PLASMA DENSITY</subject><subject>PLASMA HEATING</subject><subject>PLASMA RADIAL PROFILES</subject><subject>SCALING</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNotkFFLwzAUhYMoOKfgT8ijL533Nk2TPI6hThj4os-hTW4x0jWlSZX9ezc2OHDg8HEePsYeEVYItXjGlahBleKKLRC0KZSUcM0WACUW2ihzy-5S-gFA1MIs2HY9NP0hB8f30VPPY8fH-EcT9zTGFHKIAw-n-Nnl8Ev9gbs4jz15PvZN2jc8xXlylO7ZTdf0iR4uvWRfry-fm22x-3h736x3hRNY56LCkqSUQnmS2ghfArkKtZYGSqWEI2wdHGfyQFi3VUvQtlIL6lAJU1Ziyfj5N6YcbHIhk_t2cRjIZavqCuCIPJ0RN8WUJursOIV9Mx0sgj1JsmjPksQ_CJtYxA</recordid><startdate>19950801</startdate><enddate>19950801</enddate><creator>Vahedi, V.</creator><creator>Lieberman, M. 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D. ; Hewett, D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-412e55537de5893d20ec41885902773ce1bc03d2ed0e16b4be0bb583ef1739243</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><topic>70 PLASMA PHYSICS AND FUSION</topic><topic>COLLISIONLESS PLASMA</topic><topic>DIFFUSION</topic><topic>ELECTRON TEMPERATURE</topic><topic>ENERGY DEPOSITION</topic><topic>MATHEMATICAL MODELS</topic><topic>PLASMA DENSITY</topic><topic>PLASMA HEATING</topic><topic>PLASMA RADIAL PROFILES</topic><topic>SCALING</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Vahedi, V.</creatorcontrib><creatorcontrib>Lieberman, M. A.</creatorcontrib><creatorcontrib>DiPeso, G.</creatorcontrib><creatorcontrib>Rognlien, T. D.</creatorcontrib><creatorcontrib>Hewett, D.</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Vahedi, V.</au><au>Lieberman, M. A.</au><au>DiPeso, G.</au><au>Rognlien, T. D.</au><au>Hewett, D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Analytic model of power deposition in inductively coupled plasma sources</atitle><jtitle>Journal of Applied Physics</jtitle><date>1995-08-01</date><risdate>1995</risdate><volume>78</volume><issue>3</issue><spage>1446</spage><epage>1458</epage><pages>1446-1458</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><abstract>A simple analytic model valid for all collisionality regimes is developed to describe the power deposition in a cylindrical inductively coupled plasma source with a planar coil. The heating is ohmic at high pressures and remains finite at low pressures. The low-pressure collisionless heating is due to kinetic nonlocal effects. The model is in good agreement with other calculations of collisionless heating. A diffusion model is then used to determine the plasma density profile and the electron temperature in terms of the gas pressure and the source geometry. The heating and diffusion models are used to determine the scaling of the inductive electric field with applied frequency and input power, and the results are compared with published experimental data to verify the scaling.</abstract><cop>United States</cop><doi>10.1063/1.360723</doi><tpages>13</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0021-8979 |
| ispartof | Journal of Applied Physics, 1995-08, Vol.78 (3), p.1446-1458 |
| issn | 0021-8979 1089-7550 |
| language | eng |
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| source | AIP Digital Archive |
| subjects | 70 PLASMA PHYSICS AND FUSION COLLISIONLESS PLASMA DIFFUSION ELECTRON TEMPERATURE ENERGY DEPOSITION MATHEMATICAL MODELS PLASMA DENSITY PLASMA HEATING PLASMA RADIAL PROFILES SCALING |
| title | Analytic model of power deposition in inductively coupled plasma sources |
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