Low temperature crystallization of sputtered carbon films

The crystallization of amorphous carbon films, under inert atmospheres, occurs at annealing temperatures above 800 °C. In this work we have found that when the annealing of carbon films is performed under atmospheric conditions, crystallization occurs at temperatures as low as 200 °C. The catalytic...

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Veröffentlicht in:	Journal of applied physics 1995-09, Vol.78 (5), p.3015-3019
Hauptverfasser:	Yañez-Limón, J. M., Ruiz, F., González-Hernández, J., Chao, B. S., Ovshinsky, S. R.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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