Low temperature crystallization of sputtered carbon films

Low temperature crystallization of sputtered carbon films

The crystallization of amorphous carbon films, under inert atmospheres, occurs at annealing temperatures above 800 °C. In this work we have found that when the annealing of carbon films is performed under atmospheric conditions, crystallization occurs at temperatures as low as 200 °C. The catalytic...

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Veröffentlicht in:Journal of applied physics 1995-09, Vol.78 (5), p.3015-3019
Hauptverfasser: Yañez-Limón, J. M., Ruiz, F., González-Hernández, J., Chao, B. S., Ovshinsky, S. R.
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container_end_page 3019
container_issue 5
container_start_page 3015
container_title Journal of applied physics
container_volume 78
creator Yañez-Limón, J. M.
Ruiz, F.
González-Hernández, J.
Chao, B. S.
Ovshinsky, S. R.
description The crystallization of amorphous carbon films, under inert atmospheres, occurs at annealing temperatures above 800 °C. In this work we have found that when the annealing of carbon films is performed under atmospheric conditions, crystallization occurs at temperatures as low as 200 °C. The catalytic effect of oxygen in the crystallization process is understood in terms of the generation of a porous structure in the carbon film due to the vaporization of carbon oxides.
doi_str_mv 10.1063/1.360051
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title Low temperature crystallization of sputtered carbon films
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