Low-temperature epitaxial growth of BaTiO3 films by radio-frequency-mode electron cyclotron resonance sputtering

BaTiO3 (BTO) films have been deposited on SrTiO3 (STO) wafers by a rf-mode electron cyclotron resonance sputtering system. The substrate surface is pretreated in several ways before film deposition. The oxygen plasma irradiation is the best way of pretreating the substrate surface. Single-crystal BT...

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Veröffentlicht in:Journal of applied physics 1994-08, Vol.76 (3), p.1768-1775
Hauptverfasser: Matsuoka, Morito, Hoshino, Koichi, Ono, Ken’ichi
Format: Artikel
Sprache:eng
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