Electrical properties of AlxGa1-xN/GaN heterostructures with low Al content

Electrical properties of AlxGa1−xN/GaN heterostructures with an Al content below 15% and carrier concentrations as low as 1.0 × 1012 cm−2 were investigated by Hall effect measurements and capacitance–voltage profiling. The nominally undoped GaN capped structures were grown by low-pressure metal-orga...

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Veröffentlicht in:Journal of applied physics 2011-03, Vol.109 (5)
Hauptverfasser: Köhler, K., Müller, S., Waltereit, P., Pletschen, W., Polyakov, V., Lim, T., Kirste, L., Menner, H. P., Brückner, P., Ambacher, O., Buchheim, C., Goldhahn, R.
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container_issue 5
container_start_page
container_title Journal of applied physics
container_volume 109
creator Köhler, K.
Müller, S.
Waltereit, P.
Pletschen, W.
Polyakov, V.
Lim, T.
Kirste, L.
Menner, H. P.
Brückner, P.
Ambacher, O.
Buchheim, C.
Goldhahn, R.
description Electrical properties of AlxGa1−xN/GaN heterostructures with an Al content below 15% and carrier concentrations as low as 1.0 × 1012 cm−2 were investigated by Hall effect measurements and capacitance–voltage profiling. The nominally undoped GaN capped structures were grown by low-pressure metal-organic vapor-phase epitaxy. The threshold voltage of transistor devices follows the trend already found for high Al-containing structures, which are described by a model indicating a surface potential independent of Al content. Photoreflectance spectroscopy confirms the results for as-grown heterostructures. The Hall effect measured on the as-grown samples, however, shows a stronger decrease in carrier concentration than expected from the effect of polarization and constant surface potential. In contrast, Hall effect data determined on samples with Ni Schottky contacts and capacitance-voltage profiling on as-grown samples yield the expected behavior, with surface potentials of 0.86 eV and 0.94 eV, respectively. The inconsistency is eliminated by describing the results of the Hall effect on as-grown samples by a two-carrier model. Self-consistent Schrödinger–Poisson calculations support these considerations if we take into account a transition range at the AlxGa1−xN/GaN interface.
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title Electrical properties of AlxGa1-xN/GaN heterostructures with low Al content
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