Control of vinylsilane plasma by changing the pressure: Correspondence with a quantum chemical prediction

The pressure dependence of the chemical structure and the optical band gap of the films produced by the glow discharge decomposition of vinylsilane was studied on the basis of infrared and ultraviolet absorption spectroscopies. There was a significant structural difference between the films prepared...

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Veröffentlicht in:Journal of applied physics 1992-05, Vol.71 (9), p.4572-4576
Hauptverfasser: Sato, Kota, Uchiyama, Akihiko, Iwabuchi, Susumu, Hirano, Tsuneo, Koinuma, Hideomi
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container_issue 9
container_start_page 4572
container_title Journal of applied physics
container_volume 71
creator Sato, Kota
Uchiyama, Akihiko
Iwabuchi, Susumu
Hirano, Tsuneo
Koinuma, Hideomi
description The pressure dependence of the chemical structure and the optical band gap of the films produced by the glow discharge decomposition of vinylsilane was studied on the basis of infrared and ultraviolet absorption spectroscopies. There was a significant structural difference between the films prepared at pressures below and above 0.08 Torr. The results are discussed in relation to the initial step of gas phase reactions predicted on the basis of an ab initio molecular orbital calculation. Good consistency between the experiment and the theoretical calculation was obtained by taking a pressure dependent transition in the excited state through which the decomposition of vinylsilane predominantly proceeded into account. That is, the contribution of the transition to the lowest triplet and singlet excited states becomes larger with the increase of pressure.
doi_str_mv 10.1063/1.350755
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title Control of vinylsilane plasma by changing the pressure: Correspondence with a quantum chemical prediction
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