Effects of sputtering pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films
We have investigated the effects of sputtering Ar gas pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films. The samples were prepared by dc magnetron sputtering from 2-in.-diam Co and Pd targets by alternately exposing the substrates to targets. Sputterin...
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| Veröffentlicht in: | Journal of applied physics 1991-04, Vol.69 (8), p.5664-5666 |
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| container_title | Journal of applied physics |
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| creator | Shin, Sung-Chul Kim, Jin-Hong Ahn, Dong-Hoon |
| description | We have investigated the effects of sputtering Ar gas pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films. The samples were prepared by dc magnetron sputtering from 2-in.-diam Co and Pd targets by alternately exposing the substrates to targets. Sputtering Ar gas pressure was varied from 2 to 30 mTorr. All samples had same bilayer thicknesses composed of 2-Å-thick Co and 9-Å-thick Pd sublayers. It was observed that the intrinsic uniaxial anisotropy energy, magnetization, and polar Kerr rotation were monotonically decreased with increasing Ar gas pressures more than about 10 mTorr. Interestingly enough, the coercivity showed a thirtyfold enhancement as Ar gas pressure varied from 2 to 30 mTorr. We believe that the results are mainly ascribed to the variation of microstructure with sputtering Ar gas pressure. |
| doi_str_mv | 10.1063/1.347929 |
| format | Article |
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The samples were prepared by dc magnetron sputtering from 2-in.-diam Co and Pd targets by alternately exposing the substrates to targets. Sputtering Ar gas pressure was varied from 2 to 30 mTorr. All samples had same bilayer thicknesses composed of 2-Å-thick Co and 9-Å-thick Pd sublayers. It was observed that the intrinsic uniaxial anisotropy energy, magnetization, and polar Kerr rotation were monotonically decreased with increasing Ar gas pressures more than about 10 mTorr. Interestingly enough, the coercivity showed a thirtyfold enhancement as Ar gas pressure varied from 2 to 30 mTorr. We believe that the results are mainly ascribed to the variation of microstructure with sputtering Ar gas pressure.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.347929</identifier><identifier>CODEN: JAPIAU</identifier><language>eng</language><publisher>Woodbury, NY: American Institute of Physics</publisher><subject>Applied sciences ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Exact sciences and technology ; Magnetic properties and materials ; Magnetic properties of surface, thin films and multilayers ; Metals. Metallurgy ; Physics</subject><ispartof>Journal of applied physics, 1991-04, Vol.69 (8), p.5664-5666</ispartof><rights>1991 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c236t-28a0ead20aab9f3b6e9c2ebe7532b12bf7fb3e34f249306e9dfbaceda948616d3</citedby><cites>FETCH-LOGICAL-c236t-28a0ead20aab9f3b6e9c2ebe7532b12bf7fb3e34f249306e9dfbaceda948616d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>309,310,314,780,784,789,790,23930,23931,25140,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=19742990$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Shin, Sung-Chul</creatorcontrib><creatorcontrib>Kim, Jin-Hong</creatorcontrib><creatorcontrib>Ahn, Dong-Hoon</creatorcontrib><title>Effects of sputtering pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films</title><title>Journal of applied physics</title><description>We have investigated the effects of sputtering Ar gas pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films. The samples were prepared by dc magnetron sputtering from 2-in.-diam Co and Pd targets by alternately exposing the substrates to targets. Sputtering Ar gas pressure was varied from 2 to 30 mTorr. All samples had same bilayer thicknesses composed of 2-Å-thick Co and 9-Å-thick Pd sublayers. It was observed that the intrinsic uniaxial anisotropy energy, magnetization, and polar Kerr rotation were monotonically decreased with increasing Ar gas pressures more than about 10 mTorr. Interestingly enough, the coercivity showed a thirtyfold enhancement as Ar gas pressure varied from 2 to 30 mTorr. We believe that the results are mainly ascribed to the variation of microstructure with sputtering Ar gas pressure.</description><subject>Applied sciences</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Exact sciences and technology</subject><subject>Magnetic properties and materials</subject><subject>Magnetic properties of surface, thin films and multilayers</subject><subject>Metals. Metallurgy</subject><subject>Physics</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1991</creationdate><recordtype>article</recordtype><recordid>eNpF0E1LAzEQBuAgCtYq-BNyEbxsm4_t7uYopVahoAc9L7PJpEZ2kyVJkf57V1rwNMzMw8C8hNxztuCskku-kGWthLogM84aVdSrFbskM8YELxpVq2tyk9I3Y5w3Us3Iz8Za1DnRYGkaDzljdH5Px4gpHSLS4OkAe4_ZaQrenJtQhHGaQD_BMGLMDhN1nuowjCG57IKHvj_SIZhDDxkNXYflu6H5a0LW9UO6JVcW-oR35zonn8-bj_VLsXvbvq6fdoUWssqFaIAhGMEAOmVlV6HSAjusV1J0XHS2tp1EWVpRKsmmrbEdaDSgyqbilZFz8ni6q2NIKaJtx-gGiMeWs_YvsJa3p8Am-nCiI6TpNRvBa5f-vapLoRSTv0hebfw</recordid><startdate>19910415</startdate><enddate>19910415</enddate><creator>Shin, Sung-Chul</creator><creator>Kim, Jin-Hong</creator><creator>Ahn, Dong-Hoon</creator><general>American Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19910415</creationdate><title>Effects of sputtering pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films</title><author>Shin, Sung-Chul ; Kim, Jin-Hong ; Ahn, Dong-Hoon</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c236t-28a0ead20aab9f3b6e9c2ebe7532b12bf7fb3e34f249306e9dfbaceda948616d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1991</creationdate><topic>Applied sciences</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Exact sciences and technology</topic><topic>Magnetic properties and materials</topic><topic>Magnetic properties of surface, thin films and multilayers</topic><topic>Metals. Metallurgy</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Shin, Sung-Chul</creatorcontrib><creatorcontrib>Kim, Jin-Hong</creatorcontrib><creatorcontrib>Ahn, Dong-Hoon</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Shin, Sung-Chul</au><au>Kim, Jin-Hong</au><au>Ahn, Dong-Hoon</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of sputtering pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films</atitle><jtitle>Journal of applied physics</jtitle><date>1991-04-15</date><risdate>1991</risdate><volume>69</volume><issue>8</issue><spage>5664</spage><epage>5666</epage><pages>5664-5666</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>We have investigated the effects of sputtering Ar gas pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films. The samples were prepared by dc magnetron sputtering from 2-in.-diam Co and Pd targets by alternately exposing the substrates to targets. Sputtering Ar gas pressure was varied from 2 to 30 mTorr. All samples had same bilayer thicknesses composed of 2-Å-thick Co and 9-Å-thick Pd sublayers. It was observed that the intrinsic uniaxial anisotropy energy, magnetization, and polar Kerr rotation were monotonically decreased with increasing Ar gas pressures more than about 10 mTorr. Interestingly enough, the coercivity showed a thirtyfold enhancement as Ar gas pressure varied from 2 to 30 mTorr. We believe that the results are mainly ascribed to the variation of microstructure with sputtering Ar gas pressure.</abstract><cop>Woodbury, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.347929</doi><tpages>3</tpages></addata></record> |
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| subjects | Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Exact sciences and technology Magnetic properties and materials Magnetic properties of surface, thin films and multilayers Metals. Metallurgy Physics |
| title | Effects of sputtering pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films |
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