Two-photon subwavelength lithography with thermal light

Two-photon subwavelength lithography with thermal light

We propose an incoherent interferometer which can partly modify the spatial correlation property of thermal light. Applying the interferometer to the two-photon double-slit interference with thermal light, we find that the subwavelength interference patterns appear in the intensity correlation not o...

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Veröffentlicht in:Applied physics letters 2010-08, Vol.97 (5), p.051105-051105-3
Hauptverfasser: Cao, De-Zhong, Ge, Gui-Ju, Wang, Kaige
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container_title Applied physics letters
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creator Cao, De-Zhong
Ge, Gui-Ju
Wang, Kaige
description We propose an incoherent interferometer which can partly modify the spatial correlation property of thermal light. Applying the interferometer to the two-photon double-slit interference with thermal light, we find that the subwavelength interference patterns appear in the intensity correlation not only between two same polarized photons at different positions but also between two orthogonally polarized photons at the same position. The latter can correspond to the two-photon double-slit interference using a two-photon entangled source. Our experimental result suggests that a thermal light source is capable of accomplishing subwavelength lithography technique to surpass the Rayleigh resolution limit.
doi_str_mv 10.1063/1.3472112
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title Two-photon subwavelength lithography with thermal light
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