Thermal evolution of X/C multilayers (with X=W, Ni, or SiWSi) : a systematic study

The thermal behavior of X/C multilayers (nanometer-thick layers made of tungsten, nickel, or SiWSi alternating with carbide or pure carbon) was studied. Two types of annealing were performed: the pulsed laser annealing in air and the classical thermal annealing in a vacuum furnace. Depending on the...

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Veröffentlicht in:Journal of applied physics 1990-11, Vol.68 (10), p.5146-5154
Hauptverfasser: DUPUIS, V, RAVET, M. F, TETE, C, PIECUCH, M, LEPETRE, Y, RIVOIRA, R, ZIEGLER, E
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container_end_page 5154
container_issue 10
container_start_page 5146
container_title Journal of applied physics
container_volume 68
creator DUPUIS, V
RAVET, M. F
TETE, C
PIECUCH, M
LEPETRE, Y
RIVOIRA, R
ZIEGLER, E
description The thermal behavior of X/C multilayers (nanometer-thick layers made of tungsten, nickel, or SiWSi alternating with carbide or pure carbon) was studied. Two types of annealing were performed: the pulsed laser annealing in air and the classical thermal annealing in a vacuum furnace. Depending on the composition and the structure of the layered materials, thermal stability or diffusion mechanisms were observed and further analyzed by small-angle x-ray scattering, transmission electron microscopy, and Auger electron spectroscopy. The results show that the period expansion and the reflectivity evolution, that were observed in some cases after treatment, are caused both by structural changes into the layers and by exchange of matter between layers. These changes always induce a partial graphitization of the amorphous carbon and, in the case of W/C multilayers, the formation of a W2C compound.
doi_str_mv 10.1063/1.347055
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subjects Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
title Thermal evolution of X/C multilayers (with X=W, Ni, or SiWSi) : a systematic study
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