Thermal evolution of X/C multilayers (with X=W, Ni, or SiWSi) : a systematic study
The thermal behavior of X/C multilayers (nanometer-thick layers made of tungsten, nickel, or SiWSi alternating with carbide or pure carbon) was studied. Two types of annealing were performed: the pulsed laser annealing in air and the classical thermal annealing in a vacuum furnace. Depending on the...
Gespeichert in:
Veröffentlicht in: | Journal of applied physics 1990-11, Vol.68 (10), p.5146-5154 |
---|---|
Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 5154 |
---|---|
container_issue | 10 |
container_start_page | 5146 |
container_title | Journal of applied physics |
container_volume | 68 |
creator | DUPUIS, V RAVET, M. F TETE, C PIECUCH, M LEPETRE, Y RIVOIRA, R ZIEGLER, E |
description | The thermal behavior of X/C multilayers (nanometer-thick layers made of tungsten, nickel, or SiWSi alternating with carbide or pure carbon) was studied. Two types of annealing were performed: the pulsed laser annealing in air and the classical thermal annealing in a vacuum furnace. Depending on the composition and the structure of the layered materials, thermal stability or diffusion mechanisms were observed and further analyzed by small-angle x-ray scattering, transmission electron microscopy, and Auger electron spectroscopy. The results show that the period expansion and the reflectivity evolution, that were observed in some cases after treatment, are caused both by structural changes into the layers and by exchange of matter between layers. These changes always induce a partial graphitization of the amorphous carbon and, in the case of W/C multilayers, the formation of a W2C compound. |
doi_str_mv | 10.1063/1.347055 |
format | Article |
fullrecord | <record><control><sourceid>pascalfrancis_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_347055</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>19471533</sourcerecordid><originalsourceid>FETCH-LOGICAL-c257t-58f7b9b9dbc25e44feebbe2a11cd2ea7563e1ff188e67a417936574eb735769b3</originalsourceid><addsrcrecordid>eNpFkF1LwzAYRoMoOKfgT8iNMGHd8jZN0whejOEXDAU32e5K0r1hkXYdSab03zuZ4NXDA4dzcQi5BjYClvMxjHgmmRAnpAesUIkUgp2SHmMpJIWS6pxchPDJGEDBVY-8LzboG11T_GrrfXTtlraWrsZT2uzr6GrdoQ908O3ihq7ul0P66oa09XTulnN3S--opqELERsdXUVD3K-7S3JmdR3w6m_75OPxYTF9TmZvTy_TySypUiFjIgorjTJqbQ4fs8wiGoOpBqjWKWopco5gLRQF5lJnIBXPhczQSC5krgzvk8HRW_k2BI-23HnXaN-VwMrfFiWUxxYH9OaI7nSodG293lYu_PMqkyA45z8wRVxG</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Thermal evolution of X/C multilayers (with X=W, Ni, or SiWSi) : a systematic study</title><source>AIP Digital Archive</source><creator>DUPUIS, V ; RAVET, M. F ; TETE, C ; PIECUCH, M ; LEPETRE, Y ; RIVOIRA, R ; ZIEGLER, E</creator><creatorcontrib>DUPUIS, V ; RAVET, M. F ; TETE, C ; PIECUCH, M ; LEPETRE, Y ; RIVOIRA, R ; ZIEGLER, E</creatorcontrib><description>The thermal behavior of X/C multilayers (nanometer-thick layers made of tungsten, nickel, or SiWSi alternating with carbide or pure carbon) was studied. Two types of annealing were performed: the pulsed laser annealing in air and the classical thermal annealing in a vacuum furnace. Depending on the composition and the structure of the layered materials, thermal stability or diffusion mechanisms were observed and further analyzed by small-angle x-ray scattering, transmission electron microscopy, and Auger electron spectroscopy. The results show that the period expansion and the reflectivity evolution, that were observed in some cases after treatment, are caused both by structural changes into the layers and by exchange of matter between layers. These changes always induce a partial graphitization of the amorphous carbon and, in the case of W/C multilayers, the formation of a W2C compound.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.347055</identifier><identifier>CODEN: JAPIAU</identifier><language>eng</language><publisher>Woodbury, NY: American Institute of Physics</publisher><subject>Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties ; Physics ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><ispartof>Journal of applied physics, 1990-11, Vol.68 (10), p.5146-5154</ispartof><rights>1991 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c257t-58f7b9b9dbc25e44feebbe2a11cd2ea7563e1ff188e67a417936574eb735769b3</citedby><cites>FETCH-LOGICAL-c257t-58f7b9b9dbc25e44feebbe2a11cd2ea7563e1ff188e67a417936574eb735769b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,781,785,27929,27930</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=19471533$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>DUPUIS, V</creatorcontrib><creatorcontrib>RAVET, M. F</creatorcontrib><creatorcontrib>TETE, C</creatorcontrib><creatorcontrib>PIECUCH, M</creatorcontrib><creatorcontrib>LEPETRE, Y</creatorcontrib><creatorcontrib>RIVOIRA, R</creatorcontrib><creatorcontrib>ZIEGLER, E</creatorcontrib><title>Thermal evolution of X/C multilayers (with X=W, Ni, or SiWSi) : a systematic study</title><title>Journal of applied physics</title><description>The thermal behavior of X/C multilayers (nanometer-thick layers made of tungsten, nickel, or SiWSi alternating with carbide or pure carbon) was studied. Two types of annealing were performed: the pulsed laser annealing in air and the classical thermal annealing in a vacuum furnace. Depending on the composition and the structure of the layered materials, thermal stability or diffusion mechanisms were observed and further analyzed by small-angle x-ray scattering, transmission electron microscopy, and Auger electron spectroscopy. The results show that the period expansion and the reflectivity evolution, that were observed in some cases after treatment, are caused both by structural changes into the layers and by exchange of matter between layers. These changes always induce a partial graphitization of the amorphous carbon and, in the case of W/C multilayers, the formation of a W2C compound.</description><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</subject><subject>Physics</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1990</creationdate><recordtype>article</recordtype><recordid>eNpFkF1LwzAYRoMoOKfgT8iNMGHd8jZN0whejOEXDAU32e5K0r1hkXYdSab03zuZ4NXDA4dzcQi5BjYClvMxjHgmmRAnpAesUIkUgp2SHmMpJIWS6pxchPDJGEDBVY-8LzboG11T_GrrfXTtlraWrsZT2uzr6GrdoQ908O3ihq7ul0P66oa09XTulnN3S--opqELERsdXUVD3K-7S3JmdR3w6m_75OPxYTF9TmZvTy_TySypUiFjIgorjTJqbQ4fs8wiGoOpBqjWKWopco5gLRQF5lJnIBXPhczQSC5krgzvk8HRW_k2BI-23HnXaN-VwMrfFiWUxxYH9OaI7nSodG293lYu_PMqkyA45z8wRVxG</recordid><startdate>19901115</startdate><enddate>19901115</enddate><creator>DUPUIS, V</creator><creator>RAVET, M. F</creator><creator>TETE, C</creator><creator>PIECUCH, M</creator><creator>LEPETRE, Y</creator><creator>RIVOIRA, R</creator><creator>ZIEGLER, E</creator><general>American Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19901115</creationdate><title>Thermal evolution of X/C multilayers (with X=W, Ni, or SiWSi) : a systematic study</title><author>DUPUIS, V ; RAVET, M. F ; TETE, C ; PIECUCH, M ; LEPETRE, Y ; RIVOIRA, R ; ZIEGLER, E</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c257t-58f7b9b9dbc25e44feebbe2a11cd2ea7563e1ff188e67a417936574eb735769b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1990</creationdate><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</topic><topic>Physics</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>DUPUIS, V</creatorcontrib><creatorcontrib>RAVET, M. F</creatorcontrib><creatorcontrib>TETE, C</creatorcontrib><creatorcontrib>PIECUCH, M</creatorcontrib><creatorcontrib>LEPETRE, Y</creatorcontrib><creatorcontrib>RIVOIRA, R</creatorcontrib><creatorcontrib>ZIEGLER, E</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>DUPUIS, V</au><au>RAVET, M. F</au><au>TETE, C</au><au>PIECUCH, M</au><au>LEPETRE, Y</au><au>RIVOIRA, R</au><au>ZIEGLER, E</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Thermal evolution of X/C multilayers (with X=W, Ni, or SiWSi) : a systematic study</atitle><jtitle>Journal of applied physics</jtitle><date>1990-11-15</date><risdate>1990</risdate><volume>68</volume><issue>10</issue><spage>5146</spage><epage>5154</epage><pages>5146-5154</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>The thermal behavior of X/C multilayers (nanometer-thick layers made of tungsten, nickel, or SiWSi alternating with carbide or pure carbon) was studied. Two types of annealing were performed: the pulsed laser annealing in air and the classical thermal annealing in a vacuum furnace. Depending on the composition and the structure of the layered materials, thermal stability or diffusion mechanisms were observed and further analyzed by small-angle x-ray scattering, transmission electron microscopy, and Auger electron spectroscopy. The results show that the period expansion and the reflectivity evolution, that were observed in some cases after treatment, are caused both by structural changes into the layers and by exchange of matter between layers. These changes always induce a partial graphitization of the amorphous carbon and, in the case of W/C multilayers, the formation of a W2C compound.</abstract><cop>Woodbury, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.347055</doi><tpages>9</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0021-8979 |
ispartof | Journal of applied physics, 1990-11, Vol.68 (10), p.5146-5154 |
issn | 0021-8979 1089-7550 |
language | eng |
recordid | cdi_crossref_primary_10_1063_1_347055 |
source | AIP Digital Archive |
subjects | Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) |
title | Thermal evolution of X/C multilayers (with X=W, Ni, or SiWSi) : a systematic study |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-11T20%3A31%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Thermal%20evolution%20of%20X/C%20multilayers%20(with%20X=W,%20Ni,%20or%20SiWSi)%20:%20a%20systematic%20study&rft.jtitle=Journal%20of%20applied%20physics&rft.au=DUPUIS,%20V&rft.date=1990-11-15&rft.volume=68&rft.issue=10&rft.spage=5146&rft.epage=5154&rft.pages=5146-5154&rft.issn=0021-8979&rft.eissn=1089-7550&rft.coden=JAPIAU&rft_id=info:doi/10.1063/1.347055&rft_dat=%3Cpascalfrancis_cross%3E19471533%3C/pascalfrancis_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |