Characterization of deep-level defects in In1− x Ga x As/InP

Characterization of deep-level defects in In1− x Ga x As/InP

New characterization data are presented for the deep-level defects observed in photoluminescence (PL) spectra of InGaAs near 0.1 eV within the band gap. The literature regarding these defects is summarized and compared to the results of this study. Defects are seen to be present in In-rich, Ga-rich,...

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Veröffentlicht in:Journal of applied physics 1988-07, Vol.64 (2), p.708-712
1. Verfasser: Bacher, F. R.
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description New characterization data are presented for the deep-level defects observed in photoluminescence (PL) spectra of InGaAs near 0.1 eV within the band gap. The literature regarding these defects is summarized and compared to the results of this study. Defects are seen to be present in In-rich, Ga-rich, and lattice-matched In1−xGaxAs/InP epilayers. The PL spectra vary depending on alloy composition and crystal growth conditions. PL spectra at 77 K for 0.46
doi_str_mv 10.1063/1.341965
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R.</creator><creatorcontrib>Bacher, F. R.</creatorcontrib><description>New characterization data are presented for the deep-level defects observed in photoluminescence (PL) spectra of InGaAs near 0.1 eV within the band gap. The literature regarding these defects is summarized and compared to the results of this study. Defects are seen to be present in In-rich, Ga-rich, and lattice-matched In1−xGaxAs/InP epilayers. The PL spectra vary depending on alloy composition and crystal growth conditions. PL spectra at 77 K for 0.46&lt;x&lt;0.50 and input laser powers of 9–18 W/cm2 are given for material grown by organometallic vapor phase epitaxy. Hall mobility and Auger electron specroscopy data are also give for these epilayers. The cause of the defects is unknown, but it is not InP substrate doping or growth impurities. 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title Characterization of deep-level defects in In1− x Ga x As/InP
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