Characterization of hydrogenation and dehydrogenation of post-plasma treated low-pressure chemical vapor deposited amorphous silicon films

Utilizing infrared spectroscopy, secondary ion mass spectroscopy, photoluminescence (PL), and electron-spin resonance measurements, we have characterized low-pressure chemical vapor deposition amorphous silicon films (a-Si) post-hydrogenated under various plasma treatment conditions, and annealed on...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of applied physics 1987-11, Vol.62 (9), p.3740-3746
Hauptverfasser:	NAKAMURA, M, OHNO, T, KONISHI, N, MIYATA, K, KAMEZAWA, N
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!