Deposition of refractory metal films by rare-gas halide laser photodissociation of metal carbonyls
Films of Cr, Mo, and W on quartz, Pyrex, Suprasil, and Al substrates were deposited by photodissociation of the respective hexacarbonyls using focused and pulsed radiation from rare-gas halide lasers. Cr was deposited by dissociation of Cr(CO)6 using XeF (308 nm), KrF (249 nm), and ArF (193 nm) lase...
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| Veröffentlicht in: | J. Appl. Phys.; (United States) 1986-06, Vol.59 (11), p.3914-3917 |
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| creator | FLYNN, D. K STEINFELD, J. I SETHI, D. S |
| description | Films of Cr, Mo, and W on quartz, Pyrex, Suprasil, and Al substrates were deposited by photodissociation of the respective hexacarbonyls using focused and pulsed radiation from rare-gas halide lasers. Cr was deposited by dissociation of Cr(CO)6 using XeF (308 nm), KrF (249 nm), and ArF (193 nm) lasers. Mo and W were deposited from their respective hexacarbonyls at 249 and 193 nm. Pulse energies varied between 8 and 12 mJ. Pulse rates of 10–60 Hz were used. The pulse duration was about 10 ns. Depositions with substrates both parallel and perpendicular to the excimer radiation were attempted. Only in the case of perpendicular configuration were strongly adherent films observed. The deposition rates for thicknesses up to 3000 Å appeared to be independent of the pulse rate for all three metals. The films exhibited strong adhesion to the substrate. Scanning electron microscope photographs of the films revealed the presence of continuous metal layers. Auger and x-ray analyses of the films indicated contamination from carbon and oxygen. The source of these impurities is most likely to be CO produced in the decarbonylation of the parent hexacarbonyl. Adhesion to the substrate is apparently enhanced by laser stimulated generation of strong binding sites on the surface. |
| doi_str_mv | 10.1063/1.336736 |
| format | Article |
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K ; STEINFELD, J. I ; SETHI, D. S</creator><creatorcontrib>FLYNN, D. K ; STEINFELD, J. I ; SETHI, D. S ; Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139</creatorcontrib><description>Films of Cr, Mo, and W on quartz, Pyrex, Suprasil, and Al substrates were deposited by photodissociation of the respective hexacarbonyls using focused and pulsed radiation from rare-gas halide lasers. Cr was deposited by dissociation of Cr(CO)6 using XeF (308 nm), KrF (249 nm), and ArF (193 nm) lasers. Mo and W were deposited from their respective hexacarbonyls at 249 and 193 nm. Pulse energies varied between 8 and 12 mJ. Pulse rates of 10–60 Hz were used. The pulse duration was about 10 ns. Depositions with substrates both parallel and perpendicular to the excimer radiation were attempted. Only in the case of perpendicular configuration were strongly adherent films observed. The deposition rates for thicknesses up to 3000 Å appeared to be independent of the pulse rate for all three metals. The films exhibited strong adhesion to the substrate. Scanning electron microscope photographs of the films revealed the presence of continuous metal layers. Auger and x-ray analyses of the films indicated contamination from carbon and oxygen. The source of these impurities is most likely to be CO produced in the decarbonylation of the parent hexacarbonyl. Adhesion to the substrate is apparently enhanced by laser stimulated generation of strong binding sites on the surface.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.336736</identifier><identifier>CODEN: JAPIAU</identifier><language>eng</language><publisher>Woodbury, NY: American Institute of Physics</publisher><subject>360101 - Metals & Alloys- Preparation & Fabrication ; ADHESION ; ALUMINIUM ; Analysing. Testing. Standards ; Applied sciences ; BOROSILICATE GLASS ; CARBONYL RADICALS ; CARBONYLS ; CHALCOGENIDES ; CHEMICAL COATING ; CHEMICAL VAPOR DEPOSITION ; CHEMISTRY ; CHROMIUM ; COATINGS ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; DEPOSITION ; DIMENSIONS ; DISSOCIATION ; ELECTRON MICROSCOPY ; ELEMENTS ; Exact sciences and technology ; FLUORIDES ; FLUORINE COMPOUNDS ; GLASS ; HALIDES ; HALOGEN COMPOUNDS ; IMPURITIES ; MATERIALS SCIENCE ; Measurement of properties and materials state ; METALS ; Metals, semimetals and alloys ; Metals. Metallurgy ; MICROSCOPY ; MINERALS ; MOLYBDENUM ; Nondestructive testing ; OXIDE MINERALS ; OXIDES ; OXYGEN COMPOUNDS ; PHOTOCHEMISTRY ; Physics ; PYREX ; QUARTZ ; RADICALS ; RARE GAS COMPOUNDS ; SCANNING ELECTRON MICROSCOPY ; SILICON COMPOUNDS ; SILICON OXIDES ; Specific materials ; SURFACE COATING ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; THICKNESS ; Thin film structure and morphology ; TRANSITION ELEMENTS ; TUNGSTEN ; VAPOR DEPOSITED COATINGS ; XENON COMPOUNDS ; XENON FLUORIDES</subject><ispartof>J. Appl. Phys.; (United States), 1986-06, Vol.59 (11), p.3914-3917</ispartof><rights>1987 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c349t-449d2a5cd939bd4891cb6f9708032f8ea792e2e00d18bc5b4ee37b7a6d34cf333</citedby><cites>FETCH-LOGICAL-c349t-449d2a5cd939bd4891cb6f9708032f8ea792e2e00d18bc5b4ee37b7a6d34cf333</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,781,785,886,27929,27930</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=8053097$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/5959275$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>FLYNN, D. K</creatorcontrib><creatorcontrib>STEINFELD, J. I</creatorcontrib><creatorcontrib>SETHI, D. S</creatorcontrib><creatorcontrib>Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139</creatorcontrib><title>Deposition of refractory metal films by rare-gas halide laser photodissociation of metal carbonyls</title><title>J. Appl. Phys.; (United States)</title><description>Films of Cr, Mo, and W on quartz, Pyrex, Suprasil, and Al substrates were deposited by photodissociation of the respective hexacarbonyls using focused and pulsed radiation from rare-gas halide lasers. Cr was deposited by dissociation of Cr(CO)6 using XeF (308 nm), KrF (249 nm), and ArF (193 nm) lasers. Mo and W were deposited from their respective hexacarbonyls at 249 and 193 nm. Pulse energies varied between 8 and 12 mJ. Pulse rates of 10–60 Hz were used. The pulse duration was about 10 ns. Depositions with substrates both parallel and perpendicular to the excimer radiation were attempted. Only in the case of perpendicular configuration were strongly adherent films observed. The deposition rates for thicknesses up to 3000 Å appeared to be independent of the pulse rate for all three metals. The films exhibited strong adhesion to the substrate. Scanning electron microscope photographs of the films revealed the presence of continuous metal layers. Auger and x-ray analyses of the films indicated contamination from carbon and oxygen. The source of these impurities is most likely to be CO produced in the decarbonylation of the parent hexacarbonyl. Adhesion to the substrate is apparently enhanced by laser stimulated generation of strong binding sites on the surface.</description><subject>360101 - Metals & Alloys- Preparation & Fabrication</subject><subject>ADHESION</subject><subject>ALUMINIUM</subject><subject>Analysing. Testing. Standards</subject><subject>Applied sciences</subject><subject>BOROSILICATE GLASS</subject><subject>CARBONYL RADICALS</subject><subject>CARBONYLS</subject><subject>CHALCOGENIDES</subject><subject>CHEMICAL COATING</subject><subject>CHEMICAL VAPOR DEPOSITION</subject><subject>CHEMISTRY</subject><subject>CHROMIUM</subject><subject>COATINGS</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>DEPOSITION</subject><subject>DIMENSIONS</subject><subject>DISSOCIATION</subject><subject>ELECTRON MICROSCOPY</subject><subject>ELEMENTS</subject><subject>Exact sciences and technology</subject><subject>FLUORIDES</subject><subject>FLUORINE COMPOUNDS</subject><subject>GLASS</subject><subject>HALIDES</subject><subject>HALOGEN COMPOUNDS</subject><subject>IMPURITIES</subject><subject>MATERIALS SCIENCE</subject><subject>Measurement of properties and materials state</subject><subject>METALS</subject><subject>Metals, semimetals and alloys</subject><subject>Metals. Metallurgy</subject><subject>MICROSCOPY</subject><subject>MINERALS</subject><subject>MOLYBDENUM</subject><subject>Nondestructive testing</subject><subject>OXIDE MINERALS</subject><subject>OXIDES</subject><subject>OXYGEN COMPOUNDS</subject><subject>PHOTOCHEMISTRY</subject><subject>Physics</subject><subject>PYREX</subject><subject>QUARTZ</subject><subject>RADICALS</subject><subject>RARE GAS COMPOUNDS</subject><subject>SCANNING ELECTRON MICROSCOPY</subject><subject>SILICON COMPOUNDS</subject><subject>SILICON OXIDES</subject><subject>Specific materials</subject><subject>SURFACE COATING</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>THICKNESS</subject><subject>Thin film structure and morphology</subject><subject>TRANSITION ELEMENTS</subject><subject>TUNGSTEN</subject><subject>VAPOR DEPOSITED COATINGS</subject><subject>XENON COMPOUNDS</subject><subject>XENON FLUORIDES</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1986</creationdate><recordtype>article</recordtype><recordid>eNo9kE1LxDAURYMoOI6CPyGICzcdk76mSZYyjh8w4EbXJUlTJ9JpSl42_fdWqq7u5twL9xByzdmGsxru-QagllCfkBVnShdSCHZKVoyVvFBa6nNygfjFGOcK9IrYRz9GDDnEgcaOJt8l43JMEz36bHrahf6I1E40meSLT4P0YPrQetob9ImOh5hjGxCjC-ZvZGk6k2wcph4vyVlnevRXv7kmH0-79-1LsX97ft0-7AsHlc5FVem2NMK1GrRtK6W5s3WnJVMMyk55I3XpS89Yy5V1wlbeg7TS1C1UrgOANblZdiPm0KAL2buDi8PgXW6EFrqUYobuFsiliDjfbcYUjiZNDWfNj8CGN4vAGb1d0NGgM_0sZnAB_3nFBDAt4RubgHBf</recordid><startdate>19860601</startdate><enddate>19860601</enddate><creator>FLYNN, D. K</creator><creator>STEINFELD, J. I</creator><creator>SETHI, D. S</creator><general>American Institute of Physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>19860601</creationdate><title>Deposition of refractory metal films by rare-gas halide laser photodissociation of metal carbonyls</title><author>FLYNN, D. K ; STEINFELD, J. I ; SETHI, D. S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c349t-449d2a5cd939bd4891cb6f9708032f8ea792e2e00d18bc5b4ee37b7a6d34cf333</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1986</creationdate><topic>360101 - Metals & Alloys- Preparation & Fabrication</topic><topic>ADHESION</topic><topic>ALUMINIUM</topic><topic>Analysing. Testing. Standards</topic><topic>Applied sciences</topic><topic>BOROSILICATE GLASS</topic><topic>CARBONYL RADICALS</topic><topic>CARBONYLS</topic><topic>CHALCOGENIDES</topic><topic>CHEMICAL COATING</topic><topic>CHEMICAL VAPOR DEPOSITION</topic><topic>CHEMISTRY</topic><topic>CHROMIUM</topic><topic>COATINGS</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>DEPOSITION</topic><topic>DIMENSIONS</topic><topic>DISSOCIATION</topic><topic>ELECTRON MICROSCOPY</topic><topic>ELEMENTS</topic><topic>Exact sciences and technology</topic><topic>FLUORIDES</topic><topic>FLUORINE COMPOUNDS</topic><topic>GLASS</topic><topic>HALIDES</topic><topic>HALOGEN COMPOUNDS</topic><topic>IMPURITIES</topic><topic>MATERIALS SCIENCE</topic><topic>Measurement of properties and materials state</topic><topic>METALS</topic><topic>Metals, semimetals and alloys</topic><topic>Metals. Metallurgy</topic><topic>MICROSCOPY</topic><topic>MINERALS</topic><topic>MOLYBDENUM</topic><topic>Nondestructive testing</topic><topic>OXIDE MINERALS</topic><topic>OXIDES</topic><topic>OXYGEN COMPOUNDS</topic><topic>PHOTOCHEMISTRY</topic><topic>Physics</topic><topic>PYREX</topic><topic>QUARTZ</topic><topic>RADICALS</topic><topic>RARE GAS COMPOUNDS</topic><topic>SCANNING ELECTRON MICROSCOPY</topic><topic>SILICON COMPOUNDS</topic><topic>SILICON OXIDES</topic><topic>Specific materials</topic><topic>SURFACE COATING</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>THICKNESS</topic><topic>Thin film structure and morphology</topic><topic>TRANSITION ELEMENTS</topic><topic>TUNGSTEN</topic><topic>VAPOR DEPOSITED COATINGS</topic><topic>XENON COMPOUNDS</topic><topic>XENON FLUORIDES</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>FLYNN, D. K</creatorcontrib><creatorcontrib>STEINFELD, J. I</creatorcontrib><creatorcontrib>SETHI, D. S</creatorcontrib><creatorcontrib>Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>J. Appl. Phys.; (United States)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>FLYNN, D. K</au><au>STEINFELD, J. I</au><au>SETHI, D. S</au><aucorp>Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deposition of refractory metal films by rare-gas halide laser photodissociation of metal carbonyls</atitle><jtitle>J. Appl. Phys.; (United States)</jtitle><date>1986-06-01</date><risdate>1986</risdate><volume>59</volume><issue>11</issue><spage>3914</spage><epage>3917</epage><pages>3914-3917</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>Films of Cr, Mo, and W on quartz, Pyrex, Suprasil, and Al substrates were deposited by photodissociation of the respective hexacarbonyls using focused and pulsed radiation from rare-gas halide lasers. Cr was deposited by dissociation of Cr(CO)6 using XeF (308 nm), KrF (249 nm), and ArF (193 nm) lasers. Mo and W were deposited from their respective hexacarbonyls at 249 and 193 nm. Pulse energies varied between 8 and 12 mJ. Pulse rates of 10–60 Hz were used. The pulse duration was about 10 ns. Depositions with substrates both parallel and perpendicular to the excimer radiation were attempted. Only in the case of perpendicular configuration were strongly adherent films observed. The deposition rates for thicknesses up to 3000 Å appeared to be independent of the pulse rate for all three metals. The films exhibited strong adhesion to the substrate. Scanning electron microscope photographs of the films revealed the presence of continuous metal layers. Auger and x-ray analyses of the films indicated contamination from carbon and oxygen. The source of these impurities is most likely to be CO produced in the decarbonylation of the parent hexacarbonyl. Adhesion to the substrate is apparently enhanced by laser stimulated generation of strong binding sites on the surface.</abstract><cop>Woodbury, NY</cop><pub>American Institute of Physics</pub><doi>10.1063/1.336736</doi><tpages>4</tpages></addata></record> |
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| ispartof | J. Appl. Phys.; (United States), 1986-06, Vol.59 (11), p.3914-3917 |
| issn | 0021-8979 1089-7550 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_336736 |
| source | AIP Digital Archive |
| subjects | 360101 - Metals & Alloys- Preparation & Fabrication ADHESION ALUMINIUM Analysing. Testing. Standards Applied sciences BOROSILICATE GLASS CARBONYL RADICALS CARBONYLS CHALCOGENIDES CHEMICAL COATING CHEMICAL VAPOR DEPOSITION CHEMISTRY CHROMIUM COATINGS Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology DEPOSITION DIMENSIONS DISSOCIATION ELECTRON MICROSCOPY ELEMENTS Exact sciences and technology FLUORIDES FLUORINE COMPOUNDS GLASS HALIDES HALOGEN COMPOUNDS IMPURITIES MATERIALS SCIENCE Measurement of properties and materials state METALS Metals, semimetals and alloys Metals. Metallurgy MICROSCOPY MINERALS MOLYBDENUM Nondestructive testing OXIDE MINERALS OXIDES OXYGEN COMPOUNDS PHOTOCHEMISTRY Physics PYREX QUARTZ RADICALS RARE GAS COMPOUNDS SCANNING ELECTRON MICROSCOPY SILICON COMPOUNDS SILICON OXIDES Specific materials SURFACE COATING Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) THICKNESS Thin film structure and morphology TRANSITION ELEMENTS TUNGSTEN VAPOR DEPOSITED COATINGS XENON COMPOUNDS XENON FLUORIDES |
| title | Deposition of refractory metal films by rare-gas halide laser photodissociation of metal carbonyls |
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