Deposition and photoconductivity of hydrogenated amorphous silicon films by the pyrolysis of disilane

The thermal decomposition of disilane (Si2H6) in a hydrogen or helium flow has been used for the deposition of hydrogenated amorphous-silicon (a-Si:H) films on the surface of Corning 7059 glass substrates at 450–500 °C. The reaction product consists of monosilane and trisilane in addition to the unr...

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Veröffentlicht in:	Journal of applied physics 1986-02, Vol.59 (4), p.1319-1322
Hauptverfasser:	CHU, T. L, CHU, S. S, ANG, S. T, LO, D. H, DUONG, A, HWANG, C. G
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
Online-Zugang:	Volltext
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