Effects of atomic-scale surface morphology on carbon nanotube alignment on thermally oxidized silicon surface
We have investigated the effects of atomic-scale surface morphology on the single-walled carbon nanotube (SWNT) growth by using atomic step-structure-controlled SiO 2 / Si substrates. SWNTs initially extended randomly on the surface, and when they became longer than 3 μ m , they followed the atomi...
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Veröffentlicht in: | Applied physics letters 2010-03, Vol.96 (10), p.103102-103102-3 |
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creator | Yamada, Kazuki Chiashi, Shohei Takahashi, Katsuhiro Homma, Yoshikazu |
description | We have investigated the effects of atomic-scale surface morphology on the single-walled carbon nanotube (SWNT) growth by using atomic step-structure-controlled
SiO
2
/
Si
substrates. SWNTs initially extended randomly on the surface, and when they became longer than
3
μ
m
, they followed the atomic step morphology with a height of 0.6 nm. This indicates that SWNT extension along the surface is greatly affected by the surface morphology of the substrate. The present results also explain why the SWNT orientation on a normal
SiO
2
/
Si
surface is random. SWNTs extend along the surface morphology based on the roughness of the
SiO
2
surface. |
doi_str_mv | 10.1063/1.3354009 |
format | Article |
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SiO
2
/
Si
substrates. SWNTs initially extended randomly on the surface, and when they became longer than
3
μ
m
, they followed the atomic step morphology with a height of 0.6 nm. This indicates that SWNT extension along the surface is greatly affected by the surface morphology of the substrate. The present results also explain why the SWNT orientation on a normal
SiO
2
/
Si
surface is random. SWNTs extend along the surface morphology based on the roughness of the
SiO
2
surface.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.3354009</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>American Institute of Physics</publisher><ispartof>Applied physics letters, 2010-03, Vol.96 (10), p.103102-103102-3</ispartof><rights>2010 American Institute of Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c350t-c6e3633c1bf8db456dfe630477cbb6036e65c461d9ecaf4be660846bbb65aa0e3</citedby><cites>FETCH-LOGICAL-c350t-c6e3633c1bf8db456dfe630477cbb6036e65c461d9ecaf4be660846bbb65aa0e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.3354009$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>314,776,780,790,1553,4497,27903,27904,76130,76136</link.rule.ids></links><search><creatorcontrib>Yamada, Kazuki</creatorcontrib><creatorcontrib>Chiashi, Shohei</creatorcontrib><creatorcontrib>Takahashi, Katsuhiro</creatorcontrib><creatorcontrib>Homma, Yoshikazu</creatorcontrib><title>Effects of atomic-scale surface morphology on carbon nanotube alignment on thermally oxidized silicon surface</title><title>Applied physics letters</title><description>We have investigated the effects of atomic-scale surface morphology on the single-walled carbon nanotube (SWNT) growth by using atomic step-structure-controlled
SiO
2
/
Si
substrates. SWNTs initially extended randomly on the surface, and when they became longer than
3
μ
m
, they followed the atomic step morphology with a height of 0.6 nm. This indicates that SWNT extension along the surface is greatly affected by the surface morphology of the substrate. The present results also explain why the SWNT orientation on a normal
SiO
2
/
Si
surface is random. SWNTs extend along the surface morphology based on the roughness of the
SiO
2
surface.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp1kMFKAzEURYMoWKsL_yBbF1MT30ym3QhSahUKbnQdkjcvbWRmUpIUrF_vlM7W1eVyD3dxGLuXYiaFgkc5A6hKIRYXbCJFXRcg5fySTYQQUKhFJa_ZTUrfQ62eACasWzlHmBMPjpscOo9FQtMST4foDBLvQtzvQhu2Rx56jibaIXrTh3ywxE3rt31HfT6NeUexM207kD--8b_U8ORbj8M0vt2yK2faRHdjTtnX6-pz-VZsPtbvy5dNgVCJXKAiUAAorZs3tqxU40iBKOsarVUCFKkKSyWbBaFxpSWlxLxUdhgrYwTBlD2cfzGGlCI5vY--M_GopdAnT1rq0dPAPp_ZhD6b7EP_PzzK0sHpsyydEP4AO0xyqw</recordid><startdate>20100308</startdate><enddate>20100308</enddate><creator>Yamada, Kazuki</creator><creator>Chiashi, Shohei</creator><creator>Takahashi, Katsuhiro</creator><creator>Homma, Yoshikazu</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20100308</creationdate><title>Effects of atomic-scale surface morphology on carbon nanotube alignment on thermally oxidized silicon surface</title><author>Yamada, Kazuki ; Chiashi, Shohei ; Takahashi, Katsuhiro ; Homma, Yoshikazu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c350t-c6e3633c1bf8db456dfe630477cbb6036e65c461d9ecaf4be660846bbb65aa0e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yamada, Kazuki</creatorcontrib><creatorcontrib>Chiashi, Shohei</creatorcontrib><creatorcontrib>Takahashi, Katsuhiro</creatorcontrib><creatorcontrib>Homma, Yoshikazu</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yamada, Kazuki</au><au>Chiashi, Shohei</au><au>Takahashi, Katsuhiro</au><au>Homma, Yoshikazu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of atomic-scale surface morphology on carbon nanotube alignment on thermally oxidized silicon surface</atitle><jtitle>Applied physics letters</jtitle><date>2010-03-08</date><risdate>2010</risdate><volume>96</volume><issue>10</issue><spage>103102</spage><epage>103102-3</epage><pages>103102-103102-3</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>We have investigated the effects of atomic-scale surface morphology on the single-walled carbon nanotube (SWNT) growth by using atomic step-structure-controlled
SiO
2
/
Si
substrates. SWNTs initially extended randomly on the surface, and when they became longer than
3
μ
m
, they followed the atomic step morphology with a height of 0.6 nm. This indicates that SWNT extension along the surface is greatly affected by the surface morphology of the substrate. The present results also explain why the SWNT orientation on a normal
SiO
2
/
Si
surface is random. SWNTs extend along the surface morphology based on the roughness of the
SiO
2
surface.</abstract><pub>American Institute of Physics</pub><doi>10.1063/1.3354009</doi></addata></record> |
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ispartof | Applied physics letters, 2010-03, Vol.96 (10), p.103102-103102-3 |
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language | eng |
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title | Effects of atomic-scale surface morphology on carbon nanotube alignment on thermally oxidized silicon surface |
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