Optical properties and damage analysis of GaAs single crystals partly amorphized by ion implantation

Dielectric functions of partly amorphized GaAs layers produced by deep ion implantation of different doses of 270-keV As+ ions in crystalline (c-) GaAs have been measured from 1.5 to 6.0 eV by spectroscopic ellipsometry. We show that these dielectric functions cannot be described as physical mixture...

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Veröffentlicht in:Journal of applied physics 1984-11, Vol.56 (10), p.2664-2671
Hauptverfasser: ERMAN, M, THEETEN, J. B, CHAMBON, P, KELSO, S. M, ASPNES, D. E
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Sprache:eng
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