High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films
The diffuse dielectric barrier discharge in atmospheric pressure air was applied for the thin film deposition on polymeric web in industrially relevant roll-to-roll configuration. The silica-like film deposition was performed using the admixture of hexamethyldisiloxane precursor to air flow. Fast di...
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| Veröffentlicht in: | Applied physics letters 2010-02, Vol.96 (6), p.061502-061502-3 |
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| Sprache: | eng |
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| container_end_page | 061502-3 |
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| container_issue | 6 |
| container_start_page | 061502 |
| container_title | Applied physics letters |
| container_volume | 96 |
| creator | Starostin, S. A. Premkumar, P. Antony Creatore, M. de Vries, H. Paffen, R. M. J. van de Sanden, M. C. M. |
| description | The diffuse dielectric barrier discharge in atmospheric pressure air was applied for the thin film deposition on polymeric web in industrially relevant roll-to-roll configuration. The silica-like film deposition was performed using the admixture of hexamethyldisiloxane precursor to air flow. Fast discharge imaging at
2
μ
s
exposure time confirms plasma uniformity in a single current pulse time scale. Morphology and composition analyses indicate that the process results in ultrasmooth films (roughness comparable to initial substrate roughness) and shows the possibility to synthesize carbon-free layers. |
| doi_str_mv | 10.1063/1.3310024 |
| format | Article |
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2
μ
s
exposure time confirms plasma uniformity in a single current pulse time scale. Morphology and composition analyses indicate that the process results in ultrasmooth films (roughness comparable to initial substrate roughness) and shows the possibility to synthesize carbon-free layers.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.3310024</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>American Institute of Physics</publisher><ispartof>Applied physics letters, 2010-02, Vol.96 (6), p.061502-061502-3</ispartof><rights>2010 American Institute of Physics</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c385t-84cee7cecf1a9644ff1daa9615b8208ca2d9e98ee0c6648fb280b63ab50550a93</citedby><cites>FETCH-LOGICAL-c385t-84cee7cecf1a9644ff1daa9615b8208ca2d9e98ee0c6648fb280b63ab50550a93</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.3310024$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>314,777,781,791,1554,4498,27905,27906,76133,76139</link.rule.ids></links><search><creatorcontrib>Starostin, S. A.</creatorcontrib><creatorcontrib>Premkumar, P. Antony</creatorcontrib><creatorcontrib>Creatore, M.</creatorcontrib><creatorcontrib>de Vries, H.</creatorcontrib><creatorcontrib>Paffen, R. M. J.</creatorcontrib><creatorcontrib>van de Sanden, M. C. M.</creatorcontrib><title>High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films</title><title>Applied physics letters</title><description>The diffuse dielectric barrier discharge in atmospheric pressure air was applied for the thin film deposition on polymeric web in industrially relevant roll-to-roll configuration. The silica-like film deposition was performed using the admixture of hexamethyldisiloxane precursor to air flow. Fast discharge imaging at
2
μ
s
exposure time confirms plasma uniformity in a single current pulse time scale. Morphology and composition analyses indicate that the process results in ultrasmooth films (roughness comparable to initial substrate roughness) and shows the possibility to synthesize carbon-free layers.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp1kDFPwzAQhS0EEqUw8A-8MqTYcZI6CxKqoEWqxAKz5bjnxpA20Z07wK_HUbMyvbund0-nj7F7KRZSVOpRLpSSQuTFBZtJsVxmSkp9yWZCCJVVdSmv2Q3RV1rLXKkZ-92EfcvdCRGOke-C9yeCpNCBixgcbyxiAEwWudbiHng4chsPPQ0tjIEBgeiEwG1A7nvksU0FMPQUYuiPvPfJSTcUuuBs1oVv4D50B7plV952BHeTztnn68vHapNt39dvq-dt5pQuY6YLB7B04Ly0dVUU3sudTZMsG50L7Wy-q6HWAMJVVaF9k2vRVMo2pShLYWs1Zw_nXoc9EYI3A4aDxR8jhRmhGWkmaCn7dM6SC9GO__8fHsmZiZyZyKk_w1Z3FA</recordid><startdate>20100208</startdate><enddate>20100208</enddate><creator>Starostin, S. A.</creator><creator>Premkumar, P. Antony</creator><creator>Creatore, M.</creator><creator>de Vries, H.</creator><creator>Paffen, R. M. J.</creator><creator>van de Sanden, M. C. M.</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20100208</creationdate><title>High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films</title><author>Starostin, S. A. ; Premkumar, P. Antony ; Creatore, M. ; de Vries, H. ; Paffen, R. M. J. ; van de Sanden, M. C. M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c385t-84cee7cecf1a9644ff1daa9615b8208ca2d9e98ee0c6648fb280b63ab50550a93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Starostin, S. A.</creatorcontrib><creatorcontrib>Premkumar, P. Antony</creatorcontrib><creatorcontrib>Creatore, M.</creatorcontrib><creatorcontrib>de Vries, H.</creatorcontrib><creatorcontrib>Paffen, R. M. J.</creatorcontrib><creatorcontrib>van de Sanden, M. C. M.</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Starostin, S. A.</au><au>Premkumar, P. Antony</au><au>Creatore, M.</au><au>de Vries, H.</au><au>Paffen, R. M. J.</au><au>van de Sanden, M. C. M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films</atitle><jtitle>Applied physics letters</jtitle><date>2010-02-08</date><risdate>2010</risdate><volume>96</volume><issue>6</issue><spage>061502</spage><epage>061502-3</epage><pages>061502-061502-3</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>The diffuse dielectric barrier discharge in atmospheric pressure air was applied for the thin film deposition on polymeric web in industrially relevant roll-to-roll configuration. The silica-like film deposition was performed using the admixture of hexamethyldisiloxane precursor to air flow. Fast discharge imaging at
2
μ
s
exposure time confirms plasma uniformity in a single current pulse time scale. Morphology and composition analyses indicate that the process results in ultrasmooth films (roughness comparable to initial substrate roughness) and shows the possibility to synthesize carbon-free layers.</abstract><pub>American Institute of Physics</pub><doi>10.1063/1.3310024</doi><oa>free_for_read</oa></addata></record> |
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| ispartof | Applied physics letters, 2010-02, Vol.96 (6), p.061502-061502-3 |
| issn | 0003-6951 1077-3118 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_3310024 |
| source | AIP Journals Complete; AIP Digital Archive; Alma/SFX Local Collection |
| title | High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films |
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