Controllable optical emission spectroscopy diagnostic system for analysis of process chemistries
Optical emission spectroscopy (OES) diagnostics have been employed for many years in plasma etch end point detection schemes. Unfortunately some newer process systems have much lower optical emission or limited optical access. To overcome such limitations, an OES diagnostic system making use of vari...
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| Veröffentlicht in: | Review of scientific instruments 2010-01, Vol.81 (1), p.013502-013502-4 |
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| container_title | Review of scientific instruments |
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| creator | Thamban, P. L. Stephan Hosch, Jimmy Goeckner, M. J. |
| description | Optical emission spectroscopy (OES) diagnostics have been employed for many years in plasma etch end point detection schemes. Unfortunately some newer process systems have much lower optical emission or limited optical access. To overcome such limitations, an OES diagnostic system making use of variable e-beam has been developed. That system is described and initial experimental results are presented. A strong correlation is observed between the optical emission intensity and e-beam current, a measurable electrical parameter. This correlation offers means to normalize optical signal and to be used as a feedback input to the electronics that control the plasma source. In addition there is a measurable response from the different lines due to energy of the electrons, indicating a new degree of freedom in the diagnostic that can be tapped for more precise analysis of end point. |
| doi_str_mv | 10.1063/1.3276706 |
| format | Article |
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L. Stephan</creatorcontrib><creatorcontrib>Hosch, Jimmy</creatorcontrib><creatorcontrib>Goeckner, M. J.</creatorcontrib><title>Controllable optical emission spectroscopy diagnostic system for analysis of process chemistries</title><title>Review of scientific instruments</title><addtitle>Rev Sci Instrum</addtitle><description>Optical emission spectroscopy (OES) diagnostics have been employed for many years in plasma etch end point detection schemes. Unfortunately some newer process systems have much lower optical emission or limited optical access. To overcome such limitations, an OES diagnostic system making use of variable e-beam has been developed. That system is described and initial experimental results are presented. A strong correlation is observed between the optical emission intensity and e-beam current, a measurable electrical parameter. This correlation offers means to normalize optical signal and to be used as a feedback input to the electronics that control the plasma source. 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J.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Controllable optical emission spectroscopy diagnostic system for analysis of process chemistries</atitle><jtitle>Review of scientific instruments</jtitle><addtitle>Rev Sci Instrum</addtitle><date>2010-01-01</date><risdate>2010</risdate><volume>81</volume><issue>1</issue><spage>013502</spage><epage>013502-4</epage><pages>013502-013502-4</pages><issn>0034-6748</issn><eissn>1089-7623</eissn><coden>RSINAK</coden><abstract>Optical emission spectroscopy (OES) diagnostics have been employed for many years in plasma etch end point detection schemes. Unfortunately some newer process systems have much lower optical emission or limited optical access. To overcome such limitations, an OES diagnostic system making use of variable e-beam has been developed. That system is described and initial experimental results are presented. A strong correlation is observed between the optical emission intensity and e-beam current, a measurable electrical parameter. This correlation offers means to normalize optical signal and to be used as a feedback input to the electronics that control the plasma source. In addition there is a measurable response from the different lines due to energy of the electrons, indicating a new degree of freedom in the diagnostic that can be tapped for more precise analysis of end point.</abstract><cop>United States</cop><pub>American Institute of Physics</pub><pmid>20113095</pmid><doi>10.1063/1.3276706</doi><tpages>4</tpages></addata></record> |
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| ispartof | Review of scientific instruments, 2010-01, Vol.81 (1), p.013502-013502-4 |
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| language | eng |
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| source | AIP Journals Complete; AIP Digital Archive; Alma/SFX Local Collection |
| subjects | 70 PLASMA PHYSICS AND FUSION TECHNOLOGY BEAM CURRENTS BEAM-PLASMA SYSTEMS CHEMISTRY DEGREES OF FREEDOM ELECTRON BEAMS EMISSION SPECTROSCOPY ETCHING INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY OPTICAL SPECTROMETERS PLASMA PLASMA DIAGNOSTICS |
| title | Controllable optical emission spectroscopy diagnostic system for analysis of process chemistries |
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