Fabrication and characterization of three-dimensional all metallic photonic crystals for near infrared applications
Three-dimensional all metallic photonic crystals with a feature size of 0.20 μ m were fabricated using electron-beam lithography with the photoresist of hydrogen silesquioxane. This process method has high compatibility with the fabrication of damascene copper interconnections and also simplifies...
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| Veröffentlicht in: | Applied physics letters 2009-01, Vol.94 (4), p.041122-041122-3 |
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| container_end_page | 041122-3 |
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| container_issue | 4 |
| container_start_page | 041122 |
| container_title | Applied physics letters |
| container_volume | 94 |
| creator | Yang, Yu-Lin Hou, Fu-Ju Wu, Shich-Chuan Huang, Wen-Hsien Lai, Ming-Chih Huang, Yang-Tung |
| description | Three-dimensional all metallic photonic crystals with a feature size of
0.20
μ
m
were fabricated using electron-beam lithography with the photoresist of hydrogen silesquioxane. This process method has high compatibility with the fabrication of damascene copper interconnections and also simplifies the whole process flow. The dependence of the complete photonic band gaps on polarization was experimentally observed and compared with the simulation results. The band edge for the four-layer lattice was found at a wavelength of around
0.80
μ
m
in normal incidence. |
| doi_str_mv | 10.1063/1.3075056 |
| format | Article |
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0.20
μ
m
were fabricated using electron-beam lithography with the photoresist of hydrogen silesquioxane. This process method has high compatibility with the fabrication of damascene copper interconnections and also simplifies the whole process flow. The dependence of the complete photonic band gaps on polarization was experimentally observed and compared with the simulation results. The band edge for the four-layer lattice was found at a wavelength of around
0.80
μ
m
in normal incidence.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.3075056</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>American Institute of Physics</publisher><ispartof>Applied physics letters, 2009-01, Vol.94 (4), p.041122-041122-3</ispartof><rights>2009 American Institute of Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c284t-deb376f94fbbcbdbda3724e8819a401824ebb5373986f5a255d12947637d02d23</citedby><cites>FETCH-LOGICAL-c284t-deb376f94fbbcbdbda3724e8819a401824ebb5373986f5a255d12947637d02d23</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.3075056$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>314,777,781,791,1554,4498,27905,27906,76133,76139</link.rule.ids></links><search><creatorcontrib>Yang, Yu-Lin</creatorcontrib><creatorcontrib>Hou, Fu-Ju</creatorcontrib><creatorcontrib>Wu, Shich-Chuan</creatorcontrib><creatorcontrib>Huang, Wen-Hsien</creatorcontrib><creatorcontrib>Lai, Ming-Chih</creatorcontrib><creatorcontrib>Huang, Yang-Tung</creatorcontrib><title>Fabrication and characterization of three-dimensional all metallic photonic crystals for near infrared applications</title><title>Applied physics letters</title><description>Three-dimensional all metallic photonic crystals with a feature size of
0.20
μ
m
were fabricated using electron-beam lithography with the photoresist of hydrogen silesquioxane. This process method has high compatibility with the fabrication of damascene copper interconnections and also simplifies the whole process flow. The dependence of the complete photonic band gaps on polarization was experimentally observed and compared with the simulation results. The band edge for the four-layer lattice was found at a wavelength of around
0.80
μ
m
in normal incidence.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNp1kDtPwzAUhS0EEqUw8A-8MqT4EcfJgoQqWpAqscBsXb9UozSJbC_l1-PSDCxM59yjo3uvPoTuKVlR0vBHuuJECiKaC7SgRMqKU9peogUhhFdNJ-g1uknpq4yCcb5AaQM6BgM5jAOGwWKzhwgmuxi-z-Hocd5H5yobDm5IJYIeQ9_jg8tFgsHTfszjUIyJx1SyhP0Y8eAg4jD4CNFZDNPUz2fSLbrypeXuZl2iz83Lx_q12r1v39bPu8qwts6VdZrLxne119poqy1wyWrXtrSDmtC2eK0Fl7xrGy-ACWEp62rZcGkJs4wv0cN5r4ljStF5NcVwgHhUlKgTLUXVTKt0n87dZEL-ffP_8h9kqiBTJ2T8B3DjdFc</recordid><startdate>20090126</startdate><enddate>20090126</enddate><creator>Yang, Yu-Lin</creator><creator>Hou, Fu-Ju</creator><creator>Wu, Shich-Chuan</creator><creator>Huang, Wen-Hsien</creator><creator>Lai, Ming-Chih</creator><creator>Huang, Yang-Tung</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20090126</creationdate><title>Fabrication and characterization of three-dimensional all metallic photonic crystals for near infrared applications</title><author>Yang, Yu-Lin ; Hou, Fu-Ju ; Wu, Shich-Chuan ; Huang, Wen-Hsien ; Lai, Ming-Chih ; Huang, Yang-Tung</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c284t-deb376f94fbbcbdbda3724e8819a401824ebb5373986f5a255d12947637d02d23</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yang, Yu-Lin</creatorcontrib><creatorcontrib>Hou, Fu-Ju</creatorcontrib><creatorcontrib>Wu, Shich-Chuan</creatorcontrib><creatorcontrib>Huang, Wen-Hsien</creatorcontrib><creatorcontrib>Lai, Ming-Chih</creatorcontrib><creatorcontrib>Huang, Yang-Tung</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yang, Yu-Lin</au><au>Hou, Fu-Ju</au><au>Wu, Shich-Chuan</au><au>Huang, Wen-Hsien</au><au>Lai, Ming-Chih</au><au>Huang, Yang-Tung</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication and characterization of three-dimensional all metallic photonic crystals for near infrared applications</atitle><jtitle>Applied physics letters</jtitle><date>2009-01-26</date><risdate>2009</risdate><volume>94</volume><issue>4</issue><spage>041122</spage><epage>041122-3</epage><pages>041122-041122-3</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Three-dimensional all metallic photonic crystals with a feature size of
0.20
μ
m
were fabricated using electron-beam lithography with the photoresist of hydrogen silesquioxane. This process method has high compatibility with the fabrication of damascene copper interconnections and also simplifies the whole process flow. The dependence of the complete photonic band gaps on polarization was experimentally observed and compared with the simulation results. The band edge for the four-layer lattice was found at a wavelength of around
0.80
μ
m
in normal incidence.</abstract><pub>American Institute of Physics</pub><doi>10.1063/1.3075056</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0003-6951 |
| ispartof | Applied physics letters, 2009-01, Vol.94 (4), p.041122-041122-3 |
| issn | 0003-6951 1077-3118 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_3075056 |
| source | AIP Journals Complete; AIP Digital Archive; Alma/SFX Local Collection |
| title | Fabrication and characterization of three-dimensional all metallic photonic crystals for near infrared applications |
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