Effect of carbon codoping on boron diffusion in amorphous silicon

The effect of carbon codoping on boron diffusion in amorphous silicon is investigated during low temperature annealing. The diffusivity of boron is unaffected by carbon codoping, but the fraction of mobile boron is observed to increase with increasing carbon concentration. A concomitant reduction in...

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Veröffentlicht in:	Applied physics letters 2008-08, Vol.93 (7), p.072107-072107-3
Hauptverfasser:	Edelman, L. A., Jin, S., Jones, K. S., Elliman, R. G., Rubin, L. M.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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