Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

The surface groups created during plasma-assisted atomic layer deposition (ALD) of Al2O3 were studied by infrared spectroscopy. For temperatures in the range of 25–150°C, –CH3 and –OH were unveiled as dominant surface groups after the Al(CH3)3 precursor and O2 plasma half-cycles, respectively. At lo...

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Veröffentlicht in:	Applied physics letters 2008-06, Vol.92 (23)
Hauptverfasser:	Langereis, E., Keijmel, J., van de Sanden, M. C. M., Kessels, W. M. M.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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