Mitigation of fast ions generated from laser-produced Sn plasma for extreme ultraviolet light source by H2 gas

One of the serious problems in the laser-produced plasma for an extreme ultraviolet (EUV) light source used for the next generation lithography is the generation of fast ions that damage the EUV collector optics. In this study, the mitigation of fast ions from a laser-produced Sn plasma by a H2 back...

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Veröffentlicht in:	Journal of applied physics 2007-12, Vol.102 (12)
Hauptverfasser:	Nakamura, Daisuke, Tamaru, Koji, Hashimoto, Yuki, Okada, Tatsuo, Tanaka, Hiroki, Takahashi, Akihiko
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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