Secondary electron imaging at gas pressures in excess of 1kPa

Environmental scanning electron microscopy (ESEM) enables electron imaging of gas-mediated, direct-write nanolithography processes, liquids, and hydrated biomaterials. However, ESEM is limited by poor image quality at gas pressures in excess of ∼600Pa. Here the authors achieve high quality secondary...

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Veröffentlicht in:Applied physics letters 2007-07, Vol.91 (5)
Hauptverfasser: Toth, Milos, Uncovsky, Marek, Ralph Knowles, W., Baker, Francis S.
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Uncovsky, Marek
Ralph Knowles, W.
Baker, Francis S.
description Environmental scanning electron microscopy (ESEM) enables electron imaging of gas-mediated, direct-write nanolithography processes, liquids, and hydrated biomaterials. However, ESEM is limited by poor image quality at gas pressures in excess of ∼600Pa. Here the authors achieve high quality secondary electron imaging at 2kPa of H2O by optimizing boundary conditions that govern beam scatter and the energy distribution of low energy electrons in the gas, dielectric breakdown of the gas, and detector collection efficiency. The presented high pressure imaging method will enable imaging of hydrated materials at close to room temperature, and gas-mediated surface modification processes occurring at high pressures.
doi_str_mv 10.1063/1.2768031
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title Secondary electron imaging at gas pressures in excess of 1kPa
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