Properties of epitaxial GaN on refractory metal substrates

The authors demonstrate here that GaN films with good surface morphology and structural, optical, and electronic properties can be grown on metallic titanium carbide substrates. X-ray rocking curve and Raman scattering measurements confirmed the high crystalline quality of the wurtzite structure fil...

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Veröffentlicht in:Applied physics letters 2007-02, Vol.90 (9), p.091910-091910-3
Hauptverfasser: Freitas, Jaime A., Rowland, Larry B., Kim, Jihyun, Fatemi, Mohammad
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container_title Applied physics letters
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creator Freitas, Jaime A.
Rowland, Larry B.
Kim, Jihyun
Fatemi, Mohammad
description The authors demonstrate here that GaN films with good surface morphology and structural, optical, and electronic properties can be grown on metallic titanium carbide substrates. X-ray rocking curve and Raman scattering measurements confirmed the high crystalline quality of the wurtzite structure film. Variable temperature photoluminescence measurements of sharp and intense emission lines provided insights into the nature of the recombination processes, the carrier background type, and the carrier concentration. The high quality of the interface and substrate Ohmic contacts was verified. The ability to grow high-quality films on metallic substrates provides the means for advanced vertical and high-power and/or high-temperature device fabrication.
doi_str_mv 10.1063/1.2709512
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title Properties of epitaxial GaN on refractory metal substrates
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