High-performance flexible zinc tin oxide field-effect transistors
Flexible transistors were fabricated by sputter deposition of zinc tin oxide (ZTO) onto plasma-enhanced chemical vapor deposition gate dielectrics formed on flexible polyimide substrates with a blanket aluminum gate electrode. The flexible transistors exhibited high on-currents of 1 mA , on/off rati...
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Veröffentlicht in: | Applied physics letters 2005-11, Vol.87 (19), p.193503-193503-3 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Flexible transistors were fabricated by sputter deposition of zinc tin oxide (ZTO) onto plasma-enhanced chemical vapor deposition gate dielectrics formed on flexible polyimide substrates with a blanket aluminum gate electrode. The flexible transistors exhibited high on-currents of
1
mA
, on/off ratios of
10
6
, subthreshold voltage slopes of
1.6
V
/decade, turn-on voltages of
−
17
V
, and mobilities of
14
cm
2
V
−
1
s
−
1
. Capacitance measurements indicate that the threshold voltage and subthreshold slope are primarily influenced by residual doping in the ZTO rather than by defects at the semiconductor/dielectric interface, and are useful for assessing contact resistance. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.2120895 |