Highly resistive p-PbTe films with carrier concentration as low as 1014 cm−3

We propose here a model according to which a high density of semiconductor–insulator interface states can deplete practically the whole film volume, provided that the film thickness is of the order of Debye screening length. We demonstrated this experimentally by showing that thin p-PbTe films, ther...

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Veröffentlicht in:Applied physics letters 2004-05, Vol.84 (19), p.3732-3734
Hauptverfasser: Sandomirsky, V., Butenko, A. V., Kolobov, I. G., Ronen, A., Schlesinger, Y., Sipatov, A. Yu, Volubuev, V. V.
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container_end_page 3734
container_issue 19
container_start_page 3732
container_title Applied physics letters
container_volume 84
creator Sandomirsky, V.
Butenko, A. V.
Kolobov, I. G.
Ronen, A.
Schlesinger, Y.
Sipatov, A. Yu
Volubuev, V. V.
description We propose here a model according to which a high density of semiconductor–insulator interface states can deplete practically the whole film volume, provided that the film thickness is of the order of Debye screening length. We demonstrated this experimentally by showing that thin p-PbTe films, thermally deposited on mica substrate, have an unusually low concentration of free holes, as low as 1014 cm−3 at 100 K, resulting in a very high value of resistance, Hall constant, and Seebeck coefficient, respectively. Such low concentration of free carriers allows an investigation of a whole series of phenomena in AIVBVI semiconductors, such as injection currents, injection electroluminescence, electronic memory phenomena, electric field effect control of thermopower, and more.
doi_str_mv 10.1063/1.1728319
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title Highly resistive p-PbTe films with carrier concentration as low as 1014 cm−3
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