Effect of Ti seed layer on the magnetization reversal process of Co/NiFe/Al-oxide/NiFe junction films

Ti/Co/NiFe/Al-oxide/NiFe (F1) and Co/NiFe/Al-oxide/NiFe (F2) junction films were characterized using high-resolution electron microscopy (HREM), Lorentz transmission electron microscopy (LTEM), and alternating gradient force magnetometry (AGFM). HREM images showed that the Ti seed layer induced a st...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of applied physics 2002-04, Vol.91 (8), p.5234-5239
Hauptverfasser:	Yu, Andrew C. C., Petford-Long, Amanda K., O’Grady, Kevin, Miyazaki, Terunobu
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!