Magnetization reversal in lithographically patterned sub-200-nm Co particle arrays

A series of Co particle arrays with rectangular elements having a thickness of 10 nm, a width of 90 nm and aspect ratios of 1.3, 2.2, and 3.3, has been fabricated using interference lithography. The switching behavior of these arrays has been studied by measuring isothermal remanence measurement (IR...

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Veröffentlicht in:	Journal of applied physics 2002-05, Vol.91 (10), p.7989-7991
Hauptverfasser:	Hao, Y., Castaño, F. J., Ross, C. A., Vögeli, B., Walsh, M. E., Smith, Henry I.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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