Thermal expansion of bulk and homoepitaxial GaN

The thermal behavior of Mg-doped and intentionally undoped bulk crystals and homoepitaxial GaN was investigated in a wide temperature range from 12 to 600 K. With high-resolution x-ray diffraction, both lattice parameters a and c were determined and the thermal expansion coefficients were calculated...

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Veröffentlicht in:Applied physics letters 2000-09, Vol.77 (10), p.1434-1436
Hauptverfasser: Kirchner, V., Heinke, H., Hommel, D., Domagala, J. Z., Leszczynski, M.
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container_end_page 1436
container_issue 10
container_start_page 1434
container_title Applied physics letters
container_volume 77
creator Kirchner, V.
Heinke, H.
Hommel, D.
Domagala, J. Z.
Leszczynski, M.
description The thermal behavior of Mg-doped and intentionally undoped bulk crystals and homoepitaxial GaN was investigated in a wide temperature range from 12 to 600 K. With high-resolution x-ray diffraction, both lattice parameters a and c were determined and the thermal expansion coefficients were calculated. Within the experimental accuracy, mean values were extracted for the temperature ranges 12–100, 100–250, and 250–600 K. These values are essential, especially, for the interpretation of measurements of other GaN properties performed at low temperatures.
doi_str_mv 10.1063/1.1290491
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title Thermal expansion of bulk and homoepitaxial GaN
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