Patterning of (Pb, La)(Zr, Ti)O3 waveguides for fabricating micro-optics using wet etching and solid-phase epitaxy

The patterning process of (Pb, La)(Zr, Ti)O3 heterostructure waveguides was examined for fabricating micro-optics, including channels and lenses. After the patterning of the amorphous thin films derived from spin-cast methoxyethoxide precursors by a wet etching, the patterned amorphous film was crys...

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Veröffentlicht in:Applied physics letters 1999-08, Vol.75 (8), p.1054-1056
Hauptverfasser: Nashimoto, K., Haga, K., Watanabe, M., Nakamura, S., Osakabe, E.
Format: Artikel
Sprache:eng
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Zusammenfassung:The patterning process of (Pb, La)(Zr, Ti)O3 heterostructure waveguides was examined for fabricating micro-optics, including channels and lenses. After the patterning of the amorphous thin films derived from spin-cast methoxyethoxide precursors by a wet etching, the patterned amorphous film was crystallized by solid-phase epitaxy. A 5-μm-wide ridge-type channel waveguide was fabricated in a Pb0.91La0.09(Zr0.65Ti0.35)O3/Pb(Zr0.52Ti0.48)O3 heterostructure on a SrTiO3 (100) substrate by the process. The optical confinement was successfully observed. A mode index lens was also fabricated in the Pb0.91La0.09(Zr0.65Ti0.35)O3/Pb(Zr0.30Ti0.70)O3 heterostructure on the SrTiO3 (100) substrate. A deflection of the collimated light by the lens was observed.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.124594