Characteristics of low‐energy intense ion beam formation and transport
MEVVA‐ion sources with a modified three‐electrode ion optical system for the formation of wide aperture low‐energy (100–400 V) ion beams were used to produce ion beams of different elements with a current up to 40 mA and energy up to 400 V. The peculiarities of such beam formation and transport by a...
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| Veröffentlicht in: | Review of Scientific Instruments 1996-03, Vol.67 (3), p.1073-1075 |
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| container_title | Review of Scientific Instruments |
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| creator | Goncharov, A. A. Protsenko, I. M. Dobrovolsky, A. N. |
| description | MEVVA‐ion sources with a modified three‐electrode ion optical system for the formation of wide aperture low‐energy (100–400 V) ion beams were used to produce ion beams of different elements with a current up to 40 mA and energy up to 400 V. The peculiarities of such beam formation and transport by a wide‐aperture plasma lens (PL) are investigated. Beam transport in the transport channel is shown to be improved by the PL. PL operation in the magnetic regime shows that the suppressor grid secondary electron emission beam accompanying the ion beam has a current of 30% of the total ion beam current. These electrons contribute to the charge‐compensation plasma medium in the beam transport channel and in the PL. The main contribution to the compensating secondary electron production (60%–70%) is due to the ion beam but experimentally observed values of the beam floating potential appear high enough (25–50 V), and this does not exclude an influence of dynamical decompensation. |
| doi_str_mv | 10.1063/1.1146645 |
| format | Article |
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The main contribution to the compensating secondary electron production (60%–70%) is due to the ion beam but experimentally observed values of the beam floating potential appear high enough (25–50 V), and this does not exclude an influence of dynamical decompensation.</description><identifier>ISSN: 0034-6748</identifier><identifier>EISSN: 1089-7623</identifier><identifier>DOI: 10.1063/1.1146645</identifier><identifier>CODEN: RSINAK</identifier><language>eng</language><publisher>United States</publisher><subject>BEAM OPTICS ; BEAM PRODUCTION ; BEAM TRANSPORT ; CARBON IONS ; COPPER IONS ; EV RANGE 100-1000 ; ION BEAMS ; ION SOURCES ; MILLI AMP BEAM CURRENTS ; MOLYBDENUM IONS ; PHYSICS ; PLASMA ; ZINC IONS</subject><ispartof>Review of Scientific Instruments, 1996-03, Vol.67 (3), p.1073-1075</ispartof><rights>American Institute of Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c391t-a726284944008f56e1a883668486c83d8080ed2e6f51fdd5583b8c8ae305d6cc3</citedby><cites>FETCH-LOGICAL-c391t-a726284944008f56e1a883668486c83d8080ed2e6f51fdd5583b8c8ae305d6cc3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/rsi/article-lookup/doi/10.1063/1.1146645$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>310,311,315,781,785,790,791,886,1560,23935,23936,25145,27929,27930,76395</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/434560$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Goncharov, A. A.</creatorcontrib><creatorcontrib>Protsenko, I. M.</creatorcontrib><creatorcontrib>Dobrovolsky, A. N.</creatorcontrib><title>Characteristics of low‐energy intense ion beam formation and transport</title><title>Review of Scientific Instruments</title><description>MEVVA‐ion sources with a modified three‐electrode ion optical system for the formation of wide aperture low‐energy (100–400 V) ion beams were used to produce ion beams of different elements with a current up to 40 mA and energy up to 400 V. The peculiarities of such beam formation and transport by a wide‐aperture plasma lens (PL) are investigated. Beam transport in the transport channel is shown to be improved by the PL. PL operation in the magnetic regime shows that the suppressor grid secondary electron emission beam accompanying the ion beam has a current of 30% of the total ion beam current. These electrons contribute to the charge‐compensation plasma medium in the beam transport channel and in the PL. The main contribution to the compensating secondary electron production (60%–70%) is due to the ion beam but experimentally observed values of the beam floating potential appear high enough (25–50 V), and this does not exclude an influence of dynamical decompensation.</description><subject>BEAM OPTICS</subject><subject>BEAM PRODUCTION</subject><subject>BEAM TRANSPORT</subject><subject>CARBON IONS</subject><subject>COPPER IONS</subject><subject>EV RANGE 100-1000</subject><subject>ION BEAMS</subject><subject>ION SOURCES</subject><subject>MILLI AMP BEAM CURRENTS</subject><subject>MOLYBDENUM IONS</subject><subject>PHYSICS</subject><subject>PLASMA</subject><subject>ZINC IONS</subject><issn>0034-6748</issn><issn>1089-7623</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1996</creationdate><recordtype>article</recordtype><recordid>eNqd0E1KQzEQB_AgCtbqwhvEpcKryctHp0spagXBja5DmkzskzYpSVC68wie0ZP4agvunc0w8GOY-RNyztmIMy2u-YhzqbVUB2TAGUyasW7FIRkwJmSjxxKOyUkpb6wvxfmAzKYLm62rmLtSO1doCnSZPr4_vzBift3QLlaMBWmXIp2jXdGQ8srW7WijpzXbWNYp11NyFOyy4Nm-D8nL3e3zdNY8Pt0_TG8eGycmvDZ23OoW5ERKxiAojdwCCK1BgnYgPDBg6FvUQfHgvVIg5uDAomDKa-fEkFzs9qb-XlNcV9EtXIoRXTVSSKVZby53xuVUSsZg1rlb2bwxnJltTIabfUy9vdrZ7arfv_6H31P-g2btg_gBTi12fg</recordid><startdate>19960301</startdate><enddate>19960301</enddate><creator>Goncharov, A. 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N.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c391t-a726284944008f56e1a883668486c83d8080ed2e6f51fdd5583b8c8ae305d6cc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1996</creationdate><topic>BEAM OPTICS</topic><topic>BEAM PRODUCTION</topic><topic>BEAM TRANSPORT</topic><topic>CARBON IONS</topic><topic>COPPER IONS</topic><topic>EV RANGE 100-1000</topic><topic>ION BEAMS</topic><topic>ION SOURCES</topic><topic>MILLI AMP BEAM CURRENTS</topic><topic>MOLYBDENUM IONS</topic><topic>PHYSICS</topic><topic>PLASMA</topic><topic>ZINC IONS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Goncharov, A. A.</creatorcontrib><creatorcontrib>Protsenko, I. M.</creatorcontrib><creatorcontrib>Dobrovolsky, A. N.</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Review of Scientific Instruments</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Goncharov, A. A.</au><au>Protsenko, I. M.</au><au>Dobrovolsky, A. N.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characteristics of low‐energy intense ion beam formation and transport</atitle><jtitle>Review of Scientific Instruments</jtitle><date>1996-03-01</date><risdate>1996</risdate><volume>67</volume><issue>3</issue><spage>1073</spage><epage>1075</epage><pages>1073-1075</pages><issn>0034-6748</issn><eissn>1089-7623</eissn><coden>RSINAK</coden><abstract>MEVVA‐ion sources with a modified three‐electrode ion optical system for the formation of wide aperture low‐energy (100–400 V) ion beams were used to produce ion beams of different elements with a current up to 40 mA and energy up to 400 V. The peculiarities of such beam formation and transport by a wide‐aperture plasma lens (PL) are investigated. Beam transport in the transport channel is shown to be improved by the PL. PL operation in the magnetic regime shows that the suppressor grid secondary electron emission beam accompanying the ion beam has a current of 30% of the total ion beam current. These electrons contribute to the charge‐compensation plasma medium in the beam transport channel and in the PL. The main contribution to the compensating secondary electron production (60%–70%) is due to the ion beam but experimentally observed values of the beam floating potential appear high enough (25–50 V), and this does not exclude an influence of dynamical decompensation.</abstract><cop>United States</cop><doi>10.1063/1.1146645</doi><tpages>3</tpages></addata></record> |
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| identifier | ISSN: 0034-6748 |
| ispartof | Review of Scientific Instruments, 1996-03, Vol.67 (3), p.1073-1075 |
| issn | 0034-6748 1089-7623 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_1146645 |
| source | AIP Digital Archive |
| subjects | BEAM OPTICS BEAM PRODUCTION BEAM TRANSPORT CARBON IONS COPPER IONS EV RANGE 100-1000 ION BEAMS ION SOURCES MILLI AMP BEAM CURRENTS MOLYBDENUM IONS PHYSICS PLASMA ZINC IONS |
| title | Characteristics of low‐energy intense ion beam formation and transport |
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