Possible evidence of quantum size effects in x-ray photoemission spectra of ultrathin Si layers
This letter reports the experimental evidence of a 2.3 eV blue shift of the plasmon loss lines observed in the x-ray photoelectron spectra of an ultrathin Si layer equivalent to 1.5×1015 at./cm2 deposited onto a randomly oriented Al2O3 single crystal. The plasmon line shifts, which is roughly propo...
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| Veröffentlicht in: | Applied physics letters 1995-10, Vol.67 (17), p.2491-2493 |
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| container_end_page | 2493 |
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| container_issue | 17 |
| container_start_page | 2491 |
| container_title | Applied physics letters |
| container_volume | 67 |
| creator | Dibiase, N. Gabetta, G. Lumachi, A. Scagliotti, M. Parmigiani, F. |
| description | This letter reports the experimental evidence of a 2.3 eV blue shift of the plasmon loss lines observed in the x-ray photoelectron spectra of an ultrathin Si layer equivalent to 1.5×1015 at./cm2 deposited onto a randomly oriented Al2O3 single crystal. The plasmon line shifts, which is roughly proportional to the deposited Si(mass)−2/3, are attributed to quantum confinement effects in agreement with electron energy loss measurements performed on nanosized Si particles. |
| doi_str_mv | 10.1063/1.114618 |
| format | Article |
| fullrecord | <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_114618</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_114618</sourcerecordid><originalsourceid>FETCH-LOGICAL-c291t-a133de181ec4e743746ef26a849cee2d31a8fa12a03f1850460fa0db967082dc3</originalsourceid><addsrcrecordid>eNotkFtLxDAQhYMoWFfBn5BHX7pmkjRNH2XxBgsK6nPJphM20ptJK9Zfb5b1aWb4zhk4h5BrYGtgStzCGkAq0CckA1aWuQDQpyRjjIlcVQWck4sYP9NZcCEyUr8OMfpdixS_fYO9RTo4-jWbfpo7Gv1vAs6hnSL1Pf3Jg1nouB-mATufjENP45hoMAfb3KZl2ifhm6etWTDES3LmTBvx6n-uyMfD_fvmKd--PD5v7ra55RVMuQEhGgQNaCWWUpRSoePKaFlZRN4IMNoZ4IYJB7pgUjFnWLOrVMk0b6xYkZvjXxtSoICuHoPvTFhqYPWhmBrqYzHiDzfAVlM</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Possible evidence of quantum size effects in x-ray photoemission spectra of ultrathin Si layers</title><source>AIP Digital Archive</source><creator>Dibiase, N. ; Gabetta, G. ; Lumachi, A. ; Scagliotti, M. ; Parmigiani, F.</creator><creatorcontrib>Dibiase, N. ; Gabetta, G. ; Lumachi, A. ; Scagliotti, M. ; Parmigiani, F.</creatorcontrib><description>This letter reports the experimental evidence of a 2.3 eV blue shift of the plasmon loss lines observed in the x-ray photoelectron spectra of an ultrathin Si layer equivalent to 1.5×1015 at./cm2 deposited onto a randomly oriented Al2O3 single crystal. The plasmon line shifts, which is roughly proportional to the deposited Si(mass)−2/3, are attributed to quantum confinement effects in agreement with electron energy loss measurements performed on nanosized Si particles.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.114618</identifier><language>eng</language><ispartof>Applied physics letters, 1995-10, Vol.67 (17), p.2491-2493</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c291t-a133de181ec4e743746ef26a849cee2d31a8fa12a03f1850460fa0db967082dc3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781,27905,27906</link.rule.ids></links><search><creatorcontrib>Dibiase, N.</creatorcontrib><creatorcontrib>Gabetta, G.</creatorcontrib><creatorcontrib>Lumachi, A.</creatorcontrib><creatorcontrib>Scagliotti, M.</creatorcontrib><creatorcontrib>Parmigiani, F.</creatorcontrib><title>Possible evidence of quantum size effects in x-ray photoemission spectra of ultrathin Si layers</title><title>Applied physics letters</title><description>This letter reports the experimental evidence of a 2.3 eV blue shift of the plasmon loss lines observed in the x-ray photoelectron spectra of an ultrathin Si layer equivalent to 1.5×1015 at./cm2 deposited onto a randomly oriented Al2O3 single crystal. The plasmon line shifts, which is roughly proportional to the deposited Si(mass)−2/3, are attributed to quantum confinement effects in agreement with electron energy loss measurements performed on nanosized Si particles.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNotkFtLxDAQhYMoWFfBn5BHX7pmkjRNH2XxBgsK6nPJphM20ptJK9Zfb5b1aWb4zhk4h5BrYGtgStzCGkAq0CckA1aWuQDQpyRjjIlcVQWck4sYP9NZcCEyUr8OMfpdixS_fYO9RTo4-jWbfpo7Gv1vAs6hnSL1Pf3Jg1nouB-mATufjENP45hoMAfb3KZl2ifhm6etWTDES3LmTBvx6n-uyMfD_fvmKd--PD5v7ra55RVMuQEhGgQNaCWWUpRSoePKaFlZRN4IMNoZ4IYJB7pgUjFnWLOrVMk0b6xYkZvjXxtSoICuHoPvTFhqYPWhmBrqYzHiDzfAVlM</recordid><startdate>19951023</startdate><enddate>19951023</enddate><creator>Dibiase, N.</creator><creator>Gabetta, G.</creator><creator>Lumachi, A.</creator><creator>Scagliotti, M.</creator><creator>Parmigiani, F.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19951023</creationdate><title>Possible evidence of quantum size effects in x-ray photoemission spectra of ultrathin Si layers</title><author>Dibiase, N. ; Gabetta, G. ; Lumachi, A. ; Scagliotti, M. ; Parmigiani, F.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c291t-a133de181ec4e743746ef26a849cee2d31a8fa12a03f1850460fa0db967082dc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Dibiase, N.</creatorcontrib><creatorcontrib>Gabetta, G.</creatorcontrib><creatorcontrib>Lumachi, A.</creatorcontrib><creatorcontrib>Scagliotti, M.</creatorcontrib><creatorcontrib>Parmigiani, F.</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Dibiase, N.</au><au>Gabetta, G.</au><au>Lumachi, A.</au><au>Scagliotti, M.</au><au>Parmigiani, F.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Possible evidence of quantum size effects in x-ray photoemission spectra of ultrathin Si layers</atitle><jtitle>Applied physics letters</jtitle><date>1995-10-23</date><risdate>1995</risdate><volume>67</volume><issue>17</issue><spage>2491</spage><epage>2493</epage><pages>2491-2493</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>This letter reports the experimental evidence of a 2.3 eV blue shift of the plasmon loss lines observed in the x-ray photoelectron spectra of an ultrathin Si layer equivalent to 1.5×1015 at./cm2 deposited onto a randomly oriented Al2O3 single crystal. The plasmon line shifts, which is roughly proportional to the deposited Si(mass)−2/3, are attributed to quantum confinement effects in agreement with electron energy loss measurements performed on nanosized Si particles.</abstract><doi>10.1063/1.114618</doi><tpages>3</tpages></addata></record> |
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| identifier | ISSN: 0003-6951 |
| ispartof | Applied physics letters, 1995-10, Vol.67 (17), p.2491-2493 |
| issn | 0003-6951 1077-3118 |
| language | eng |
| recordid | cdi_crossref_primary_10_1063_1_114618 |
| source | AIP Digital Archive |
| title | Possible evidence of quantum size effects in x-ray photoemission spectra of ultrathin Si layers |
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