Characteristics of optical components for soft x‐ray microscopy and x‐ray holography using an undulator radiation optical system (abstract)

X‐ray Fresnel zone plates and transmission gratings, have been fabricated using fine‐focused electron‐beam lithography and Ta‐on‐SiN x‐ray mask fabrication technique. The optical components for x‐ray microscopy and x‐ray holography were evaluated in an undulator radiation system. Nanometer lithograp...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Kakuchi, Masami, Ozawa, Akira, Ohkubo, Takashi, Maezawa, Hideki, Kagoshima, Yasushi, Ando, Masami
Format: Tagungsbericht
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!