Se chemical passivation and annealing treatment for GaAs Schottky diode

A Se chemical passivation [(NH4)2S+Se] for GaAs Schottky diodes is presented. We have found that our (NH4)2S+Se passivated Schottky diodes have more than one order of magnitude higher forward current density than the (NH4)2Sx passivated ones. In rapid thermal annealing treatment, an initial decrease...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 1995-04, Vol.66 (16), p.2125-2127
Hauptverfasser: Xu, Huaiqi, Belkouch, Saïd, Aktik, Cetin, Rasmussen, Wolfgang
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 2127
container_issue 16
container_start_page 2125
container_title Applied physics letters
container_volume 66
creator Xu, Huaiqi
Belkouch, Saïd
Aktik, Cetin
Rasmussen, Wolfgang
description A Se chemical passivation [(NH4)2S+Se] for GaAs Schottky diodes is presented. We have found that our (NH4)2S+Se passivated Schottky diodes have more than one order of magnitude higher forward current density than the (NH4)2Sx passivated ones. In rapid thermal annealing treatment, an initial decrease and then increase of forward current density for (NH4)2Sx passivated diodes is observed. For the (NH4)2S+Se and (NH4)OH treated diodes, a steady decrease of Schottky barrier height with increased annealing temperature is observed. With or without annealing treatment, the (NH4)2S+Se passivated diodes have the lowest barrier height.
doi_str_mv 10.1063/1.113924
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1063_1_113924</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_113924</sourcerecordid><originalsourceid>FETCH-LOGICAL-c227t-d275d757199775b08cae5822b5d6ab0df3c6b15539eec5a3b01cf703d7ca6bd3</originalsourceid><addsrcrecordid>eNotj0tLAzEURoMoOFbBn5Clm6m5uWYysyxFp0LBRbsfbh5jo_MoSRD6763UxeHjbD44jD2CWIKo8BmWANjIlytWgNC6RID6mhVCCCyrRsEtu0vp66xKIhas3XluD34MlgZ-pJTCD-UwT5wmd2byNITpk-foKY9-yryfI29plfjOHuacv0_chdn5e3bT05D8w_8u2P7tdb_elNuP9n292pZWSp1LJ7VyWmloGq2VEbUlr2opjXIVGeF6tJUBpbDx3ipCI8D2WqDTlirjcMGeLrc2zilF33fHGEaKpw5E99ffQXfpx1-HMEz-</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Se chemical passivation and annealing treatment for GaAs Schottky diode</title><source>AIP Digital Archive</source><creator>Xu, Huaiqi ; Belkouch, Saïd ; Aktik, Cetin ; Rasmussen, Wolfgang</creator><creatorcontrib>Xu, Huaiqi ; Belkouch, Saïd ; Aktik, Cetin ; Rasmussen, Wolfgang</creatorcontrib><description>A Se chemical passivation [(NH4)2S+Se] for GaAs Schottky diodes is presented. We have found that our (NH4)2S+Se passivated Schottky diodes have more than one order of magnitude higher forward current density than the (NH4)2Sx passivated ones. In rapid thermal annealing treatment, an initial decrease and then increase of forward current density for (NH4)2Sx passivated diodes is observed. For the (NH4)2S+Se and (NH4)OH treated diodes, a steady decrease of Schottky barrier height with increased annealing temperature is observed. With or without annealing treatment, the (NH4)2S+Se passivated diodes have the lowest barrier height.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.113924</identifier><language>eng</language><ispartof>Applied physics letters, 1995-04, Vol.66 (16), p.2125-2127</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c227t-d275d757199775b08cae5822b5d6ab0df3c6b15539eec5a3b01cf703d7ca6bd3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids></links><search><creatorcontrib>Xu, Huaiqi</creatorcontrib><creatorcontrib>Belkouch, Saïd</creatorcontrib><creatorcontrib>Aktik, Cetin</creatorcontrib><creatorcontrib>Rasmussen, Wolfgang</creatorcontrib><title>Se chemical passivation and annealing treatment for GaAs Schottky diode</title><title>Applied physics letters</title><description>A Se chemical passivation [(NH4)2S+Se] for GaAs Schottky diodes is presented. We have found that our (NH4)2S+Se passivated Schottky diodes have more than one order of magnitude higher forward current density than the (NH4)2Sx passivated ones. In rapid thermal annealing treatment, an initial decrease and then increase of forward current density for (NH4)2Sx passivated diodes is observed. For the (NH4)2S+Se and (NH4)OH treated diodes, a steady decrease of Schottky barrier height with increased annealing temperature is observed. With or without annealing treatment, the (NH4)2S+Se passivated diodes have the lowest barrier height.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNotj0tLAzEURoMoOFbBn5Clm6m5uWYysyxFp0LBRbsfbh5jo_MoSRD6763UxeHjbD44jD2CWIKo8BmWANjIlytWgNC6RID6mhVCCCyrRsEtu0vp66xKIhas3XluD34MlgZ-pJTCD-UwT5wmd2byNITpk-foKY9-yryfI29plfjOHuacv0_chdn5e3bT05D8w_8u2P7tdb_elNuP9n292pZWSp1LJ7VyWmloGq2VEbUlr2opjXIVGeF6tJUBpbDx3ipCI8D2WqDTlirjcMGeLrc2zilF33fHGEaKpw5E99ffQXfpx1-HMEz-</recordid><startdate>19950417</startdate><enddate>19950417</enddate><creator>Xu, Huaiqi</creator><creator>Belkouch, Saïd</creator><creator>Aktik, Cetin</creator><creator>Rasmussen, Wolfgang</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19950417</creationdate><title>Se chemical passivation and annealing treatment for GaAs Schottky diode</title><author>Xu, Huaiqi ; Belkouch, Saïd ; Aktik, Cetin ; Rasmussen, Wolfgang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c227t-d275d757199775b08cae5822b5d6ab0df3c6b15539eec5a3b01cf703d7ca6bd3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Xu, Huaiqi</creatorcontrib><creatorcontrib>Belkouch, Saïd</creatorcontrib><creatorcontrib>Aktik, Cetin</creatorcontrib><creatorcontrib>Rasmussen, Wolfgang</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Xu, Huaiqi</au><au>Belkouch, Saïd</au><au>Aktik, Cetin</au><au>Rasmussen, Wolfgang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Se chemical passivation and annealing treatment for GaAs Schottky diode</atitle><jtitle>Applied physics letters</jtitle><date>1995-04-17</date><risdate>1995</risdate><volume>66</volume><issue>16</issue><spage>2125</spage><epage>2127</epage><pages>2125-2127</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>A Se chemical passivation [(NH4)2S+Se] for GaAs Schottky diodes is presented. We have found that our (NH4)2S+Se passivated Schottky diodes have more than one order of magnitude higher forward current density than the (NH4)2Sx passivated ones. In rapid thermal annealing treatment, an initial decrease and then increase of forward current density for (NH4)2Sx passivated diodes is observed. For the (NH4)2S+Se and (NH4)OH treated diodes, a steady decrease of Schottky barrier height with increased annealing temperature is observed. With or without annealing treatment, the (NH4)2S+Se passivated diodes have the lowest barrier height.</abstract><doi>10.1063/1.113924</doi><tpages>3</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0003-6951
ispartof Applied physics letters, 1995-04, Vol.66 (16), p.2125-2127
issn 0003-6951
1077-3118
language eng
recordid cdi_crossref_primary_10_1063_1_113924
source AIP Digital Archive
title Se chemical passivation and annealing treatment for GaAs Schottky diode
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-11T18%3A45%3A44IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Se%20chemical%20passivation%20and%20annealing%20treatment%20for%20GaAs%20Schottky%20diode&rft.jtitle=Applied%20physics%20letters&rft.au=Xu,%20Huaiqi&rft.date=1995-04-17&rft.volume=66&rft.issue=16&rft.spage=2125&rft.epage=2127&rft.pages=2125-2127&rft.issn=0003-6951&rft.eissn=1077-3118&rft_id=info:doi/10.1063/1.113924&rft_dat=%3Ccrossref%3E10_1063_1_113924%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true