Oxide-nitride-oxide/Si(111) interfaces analyzed by optical second harmonic generation
Optical second harmonic generation has been used to study oxide-nitride-oxide/Si(111) interfaces. The second harmonic (SH) intensity is measured as a function of an azimuthal rotation angle at a 45° incidence angle. The SH intensities change for wet oxidation, nitridation and reoxidation. The SH int...
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Veröffentlicht in: | Applied physics letters 1995-04, Vol.66 (17), p.2232-2234 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Optical second harmonic generation has been used to study oxide-nitride-oxide/Si(111) interfaces. The second harmonic (SH) intensity is measured as a function of an azimuthal rotation angle at a 45° incidence angle. The SH intensities change for wet oxidation, nitridation and reoxidation. The SH intensity from wet oxide/Si(111) interface decreases as the temperature during wet oxidation increases. With subsequent nitridation, this SH intensity of the oxidized interface then decreases. However, the SH intensity increases again with reoxidation. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.113176 |