Silicon-induced local interface dipole in Al/GaAs(001) Schottky diodes

Al/Si/GaAs(001) diode structures grown by molecular beam epitaxy were examined as a function of the thickness of the Si interface layer and the intensity of the As or Al flux employed during Si deposition. We found that Schottky barriers as low as 0.3–0.4 eV (in the presence of a sufficiently high A...

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Veröffentlicht in:Applied physics letters 1994-02, Vol.64 (8), p.988-990
Hauptverfasser: Cantile, M., Sorba, L., Yildirim, S., Faraci, P., Biasiol, G., Franciosi, A., Miller, T. J., Nathan, M. I.
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container_end_page 990
container_issue 8
container_start_page 988
container_title Applied physics letters
container_volume 64
creator Cantile, M.
Sorba, L.
Yildirim, S.
Faraci, P.
Biasiol, G.
Franciosi, A.
Miller, T. J.
Nathan, M. I.
description Al/Si/GaAs(001) diode structures grown by molecular beam epitaxy were examined as a function of the thickness of the Si interface layer and the intensity of the As or Al flux employed during Si deposition. We found that Schottky barriers as low as 0.3–0.4 eV (in the presence of a sufficiently high As flux) or as high as 1.0–1.1 eV (in the presence of a sufficiently high Al flux) can be established on n-type GaAs at Si coverages in the submonolayer to monolayer range. We therefore associate the tunability of the barrier height with a Si-induced local interface dipole.
doi_str_mv 10.1063/1.110927
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title Silicon-induced local interface dipole in Al/GaAs(001) Schottky diodes
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