Boron diffusion in Co74Ti26 amorphous alloy

Boron diffusion in implanted Co74Ti26 amorphous alloy has been studied by secondary ion mass spectrometry (SIMS). Auger electron spectroscopy depth profiling, Rutherford backscattering spectroscopy, and x-ray diffraction have been used to control the crystallization and the interaction with the Si s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Applied physics letters 1992-02, Vol.60 (6), p.701-703
Hauptverfasser:	LA VIA, F, JANSSEN, K. T. F, READER, A. H
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Condensed matter: structure, mechanical and thermal properties Diffusion in solids Diffusion of impurities Exact sciences and technology Metals. Metallurgy Physics Transport properties of condensed matter (nonelectronic)
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!