Absence of an evaporation-driven wetting transition on omniphobic surfaces

Surfaces that exhibit contact angles close to 180° for both polar and non-polar solvents are rare. Here we report the fabrication of such "omniphobic" surfaces by photolithography. We investigate their stability against a so-called wetting transition during evaporation of millimetric water...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Soft matter 2012-01, Vol.8 (38), p.9765-977
Hauptverfasser:	Susarrey-Arce, A, Marín, Á. G, Nair, H, Lefferts, L, Gardeniers, J. G. E, Lohse, D, van Houselt, A
Format:	Artikel
Sprache:	eng
Schlagworte:	Contact angle Curvature Droplets Evaporation Photolithography Robustness Surface roughness Wetting
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!