Atomic/molecular layer deposited thin-film alloys of Ti-4,4-oxydianiline hybrid-TiO2 with tunable properties

By combining atomic layer deposition (ALD) and molecular layer deposition (MLD) thin-film techniques, the latter being a variant of the former in which organic precursors are used, it is possible to deposit thin films containing precisely controlled portions of inorganic and organic constituents. Th...

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Veröffentlicht in:	Dalton transactions : an international journal of inorganic chemistry 2012-09, Vol.41 (35), p.1731-1739
Hauptverfasser:	Sundberg, Pia, Sood, Anjali, Liu, Xuwen, Johansson, Leena-Sisko, Karppinen, Maarit
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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