Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors

Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors

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Veröffentlicht in:Journal of materials chemistry 2005-01, Vol.15 (19), p.1896-1902
Hauptverfasser: YIM FUN LOO, O'KANE, Ruairi, JONES, Anthony C, ASPINALL, Helen C, POTTER, Richard J, CHALKER, Paul R, BICKLEY, Jamie F, TAYLOR, Stephen, SMITH, Lesley M
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Sprache:eng
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Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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container_end_page 1902
container_issue 19
container_start_page 1896
container_title Journal of materials chemistry
container_volume 15
creator YIM FUN LOO
O'KANE, Ruairi
JONES, Anthony C
ASPINALL, Helen C
POTTER, Richard J
CHALKER, Paul R
BICKLEY, Jamie F
TAYLOR, Stephen
SMITH, Lesley M
description
doi_str_mv 10.1039/b417389a
format Article
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ispartof Journal of materials chemistry, 2005-01, Vol.15 (19), p.1896-1902
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1364-5501
language eng
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source Royal Society of Chemistry Journals Archive (1841-2007); Royal Society Of Chemistry Journals 2008-
subjects Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
title Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors
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