Deposition of tin sulfide thin films from tin(IV) thiolate precursors
Gespeichert in:
| Veröffentlicht in: | Journal of materials chemistry 2001, Vol.11 (2), p.464-468 |
|---|---|
| Hauptverfasser: | , , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 468 |
|---|---|
| container_issue | 2 |
| container_start_page | 464 |
| container_title | Journal of materials chemistry |
| container_volume | 11 |
| creator | BARONE, Giampaolo HIBBERT, Tom G MAHON, Mary F MOLLOY, Kieran C PRICE, Louise S PARKIN, Ivan P HARDY, Amanda M. E FIELD, Mark N |
| description | |
| doi_str_mv | 10.1039/b005888m |
| format | Article |
| fullrecord | <record><control><sourceid>pascalfrancis_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1039_b005888m</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>934111</sourcerecordid><originalsourceid>FETCH-LOGICAL-c319t-f5e18e30ea21977a9a4a46f2f951e3e14d789db8c236a621e9d596ccc3851ad53</originalsourceid><addsrcrecordid>eNo9j01LxDAYhIMoWFfBnxDwsh6qeZuPJkdZV11Y8KJeSzZNMNI2JW_34L93y6qnYWYeBoaQa2B3wLi53zEmtdb9CSmAK1FKyeCUFMxIUxpR6XNygfjFGECtZEHWj35MGKeYBpoCneJAcd-F2Ho6fR5MiF2PNOTUz91y83E756mzk6dj9m6fMWW8JGfBduivfnVB3p_Wb6uXcvv6vFk9bEvHwUxlkB6058zbCkxdW2OFFSpUwUjw3INoa23anXYVV1ZV4E0rjXLOcS3BtpIvyPK463JCzD40Y469zd8NsGa-3_zdP6A3R3S06GwXsh1cxH_ecAEA_AcCtVlV</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Deposition of tin sulfide thin films from tin(IV) thiolate precursors</title><source>Royal Society of Chemistry Journals Archive (1841-2007)</source><source>Royal Society Of Chemistry Journals 2008-</source><creator>BARONE, Giampaolo ; HIBBERT, Tom G ; MAHON, Mary F ; MOLLOY, Kieran C ; PRICE, Louise S ; PARKIN, Ivan P ; HARDY, Amanda M. E ; FIELD, Mark N</creator><creatorcontrib>BARONE, Giampaolo ; HIBBERT, Tom G ; MAHON, Mary F ; MOLLOY, Kieran C ; PRICE, Louise S ; PARKIN, Ivan P ; HARDY, Amanda M. E ; FIELD, Mark N</creatorcontrib><identifier>ISSN: 0959-9428</identifier><identifier>EISSN: 1364-5501</identifier><identifier>DOI: 10.1039/b005888m</identifier><language>eng</language><publisher>Cambridge: Royal Society of Chemistry</publisher><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics</subject><ispartof>Journal of materials chemistry, 2001, Vol.11 (2), p.464-468</ispartof><rights>2001 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c319t-f5e18e30ea21977a9a4a46f2f951e3e14d789db8c236a621e9d596ccc3851ad53</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,781,785,2832,4025,27928,27929,27930</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=934111$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>BARONE, Giampaolo</creatorcontrib><creatorcontrib>HIBBERT, Tom G</creatorcontrib><creatorcontrib>MAHON, Mary F</creatorcontrib><creatorcontrib>MOLLOY, Kieran C</creatorcontrib><creatorcontrib>PRICE, Louise S</creatorcontrib><creatorcontrib>PARKIN, Ivan P</creatorcontrib><creatorcontrib>HARDY, Amanda M. E</creatorcontrib><creatorcontrib>FIELD, Mark N</creatorcontrib><title>Deposition of tin sulfide thin films from tin(IV) thiolate precursors</title><title>Journal of materials chemistry</title><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><issn>0959-9428</issn><issn>1364-5501</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><recordid>eNo9j01LxDAYhIMoWFfBnxDwsh6qeZuPJkdZV11Y8KJeSzZNMNI2JW_34L93y6qnYWYeBoaQa2B3wLi53zEmtdb9CSmAK1FKyeCUFMxIUxpR6XNygfjFGECtZEHWj35MGKeYBpoCneJAcd-F2Ho6fR5MiF2PNOTUz91y83E756mzk6dj9m6fMWW8JGfBduivfnVB3p_Wb6uXcvv6vFk9bEvHwUxlkB6058zbCkxdW2OFFSpUwUjw3INoa23anXYVV1ZV4E0rjXLOcS3BtpIvyPK463JCzD40Y469zd8NsGa-3_zdP6A3R3S06GwXsh1cxH_ecAEA_AcCtVlV</recordid><startdate>2001</startdate><enddate>2001</enddate><creator>BARONE, Giampaolo</creator><creator>HIBBERT, Tom G</creator><creator>MAHON, Mary F</creator><creator>MOLLOY, Kieran C</creator><creator>PRICE, Louise S</creator><creator>PARKIN, Ivan P</creator><creator>HARDY, Amanda M. E</creator><creator>FIELD, Mark N</creator><general>Royal Society of Chemistry</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>2001</creationdate><title>Deposition of tin sulfide thin films from tin(IV) thiolate precursors</title><author>BARONE, Giampaolo ; HIBBERT, Tom G ; MAHON, Mary F ; MOLLOY, Kieran C ; PRICE, Louise S ; PARKIN, Ivan P ; HARDY, Amanda M. E ; FIELD, Mark N</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c319t-f5e18e30ea21977a9a4a46f2f951e3e14d789db8c236a621e9d596ccc3851ad53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>BARONE, Giampaolo</creatorcontrib><creatorcontrib>HIBBERT, Tom G</creatorcontrib><creatorcontrib>MAHON, Mary F</creatorcontrib><creatorcontrib>MOLLOY, Kieran C</creatorcontrib><creatorcontrib>PRICE, Louise S</creatorcontrib><creatorcontrib>PARKIN, Ivan P</creatorcontrib><creatorcontrib>HARDY, Amanda M. E</creatorcontrib><creatorcontrib>FIELD, Mark N</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Journal of materials chemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>BARONE, Giampaolo</au><au>HIBBERT, Tom G</au><au>MAHON, Mary F</au><au>MOLLOY, Kieran C</au><au>PRICE, Louise S</au><au>PARKIN, Ivan P</au><au>HARDY, Amanda M. E</au><au>FIELD, Mark N</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deposition of tin sulfide thin films from tin(IV) thiolate precursors</atitle><jtitle>Journal of materials chemistry</jtitle><date>2001</date><risdate>2001</risdate><volume>11</volume><issue>2</issue><spage>464</spage><epage>468</epage><pages>464-468</pages><issn>0959-9428</issn><eissn>1364-5501</eissn><cop>Cambridge</cop><pub>Royal Society of Chemistry</pub><doi>10.1039/b005888m</doi><tpages>5</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0959-9428 |
| ispartof | Journal of materials chemistry, 2001, Vol.11 (2), p.464-468 |
| issn | 0959-9428 1364-5501 |
| language | eng |
| recordid | cdi_crossref_primary_10_1039_b005888m |
| source | Royal Society of Chemistry Journals Archive (1841-2007); Royal Society Of Chemistry Journals 2008- |
| subjects | Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics |
| title | Deposition of tin sulfide thin films from tin(IV) thiolate precursors |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-13T22%3A40%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Deposition%20of%20tin%20sulfide%20thin%20films%20from%20tin(IV)%20thiolate%20precursors&rft.jtitle=Journal%20of%20materials%20chemistry&rft.au=BARONE,%20Giampaolo&rft.date=2001&rft.volume=11&rft.issue=2&rft.spage=464&rft.epage=468&rft.pages=464-468&rft.issn=0959-9428&rft.eissn=1364-5501&rft_id=info:doi/10.1039/b005888m&rft_dat=%3Cpascalfrancis_cross%3E934111%3C/pascalfrancis_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |