Dual function of precisely modified hydroxy-PS- b -PMMA as neutral layers and thin films for perpendicularly oriented lamella

We propose a facile and fast control method to obtain perpendicularly oriented microphase-separated structures in block copolymer (BCP) thin films for nanopatterning with a BCP lithography technique. By synthesizing a derivative of polystyrene- block -poly(methyl methacrylate) (PS- b -PMMA) with pre...

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Veröffentlicht in:RSC applied interfaces 2025
Hauptverfasser: Mizusaki, Riku, Maekawa, Shinsuke, Seshimo, Takehiro, Dazai, Takahiro, Sato, Kazufumi, Hatakeyama-Sato, Kan, Nabae, Yuta, Hayakawa, Teruaki
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Sprache:eng
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