Structural and chemical properties of NiO x thin films: the role of oxygen vacancies in NiOOH formation in a H 2 O atmosphere

NiO x films grown from 50 nm thick Ni on Si(111) were put in contact with oxygen and subsequently water vapor at elevated temperatures. Near ambient pressure (NAP)-XPS and -XAS reveal the formation of oxygen vacancies at elevated temperatures, followed by H 2 O dissociation and saturation of the oxy...

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Veröffentlicht in:	Physical chemistry chemical physics : PCCP 2023-09, Vol.25 (37), p.25552-25565
Hauptverfasser:	Blume, A. Raoul, Calvet, Wolfram, Ghafari, Aliakbar, Mayer, Thomas, Knop-Gericke, Axel, Schlögl, Robert
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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