A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential

While developing a new resist for different lithography applications, starting from high to low nodes, the potential of the resist in successful pattern transfer has been the key for practical applications particularly in semiconductor industries. Although semiconductor industries are looking for ma...

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Veröffentlicht in:	Materials chemistry frontiers 2017-09, Vol.1 (9), p.1895-1899
Hauptverfasser:	Nandi, Santu, Yogesh, Midathala, Reddy, Pulikanti Guruprasad, Sharma, Satinder K., Pradeep, Chullikkattil P., Ghosh, Subrata, Gonsalves, Kenneth E.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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