Covalent bonding-assisted nanotransfer lithography for the fabrication of plasmonic nano-optical elements

Many high-resolution patterning techniques have been developed to realize nano- and microscale applications of electric devices, sensors, and transistors. However, conventional patterning methods based on photo or e-beam lithography are not employed to fabricate optical elements of high aspect ratio...

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Veröffentlicht in:Nanoscale 2017-10, Vol.9 (38), p.14335-14346
Hauptverfasser: Hwang, Soon Hyoung, Jeon, Sohee, Kim, Myung Ju, Choi, Dae-Geun, Choi, Jun-Hyuk, Jung, Joo-Yun, Kim, Kwang-Seop, Lee, Jihye, Jeong, Jun Ho, Youn, Jae Ryoun
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Sprache:eng
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