Effects of ambient gas on cold atmospheric plasma discharge in the decomposition of trifluoromethane
The effect of dilution gases (He, Ar and N 2 ) on plasma discharge in the decomposition of trifluoromethane (CHF 3 ) was investigated in dielectric barrier discharge at atmospheric pressure. A comparison among these dilution gases was performed in terms of active power, apparent power, power factor,...
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| Veröffentlicht in: | RSC advances 2016-01, Vol.6 (32), p.2655-26513 |
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| creator | Nguyen, D. B Lee, W. G |
| description | The effect of dilution gases (He, Ar and N
2
) on plasma discharge in the decomposition of trifluoromethane (CHF
3
) was investigated in dielectric barrier discharge at atmospheric pressure. A comparison among these dilution gases was performed in terms of active power, apparent power, power factor, impedance, and power efficiency for the decomposition of CHF
3
. He dilution showed the most homogeneous and stable discharge among the dilution gases. However, Ar dilution ignited the generation of streamers in the plasma discharge, resulting in a relatively superior power efficiency in CHF
3
decomposition. In addition, due to the plasma reactions between O
2
and N
2
, N
2
as a dilution gas had a disadvantaging tendency to form nitric oxide compounds (harmful compounds). Complete decomposition of CHF
3
could be performed under the following conditions; Ar dilution, active power ≥ 40 W, a CHF
3
fraction of 0.2% and a total flow rate of 1000 ml min
−1
.
N
2
< He < Ar: the order of energy efficiency for CHF
3
decomposition among these gas discharges. |
| doi_str_mv | 10.1039/c6ra01485b |
| format | Article |
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2
) on plasma discharge in the decomposition of trifluoromethane (CHF
3
) was investigated in dielectric barrier discharge at atmospheric pressure. A comparison among these dilution gases was performed in terms of active power, apparent power, power factor, impedance, and power efficiency for the decomposition of CHF
3
. He dilution showed the most homogeneous and stable discharge among the dilution gases. However, Ar dilution ignited the generation of streamers in the plasma discharge, resulting in a relatively superior power efficiency in CHF
3
decomposition. In addition, due to the plasma reactions between O
2
and N
2
, N
2
as a dilution gas had a disadvantaging tendency to form nitric oxide compounds (harmful compounds). Complete decomposition of CHF
3
could be performed under the following conditions; Ar dilution, active power ≥ 40 W, a CHF
3
fraction of 0.2% and a total flow rate of 1000 ml min
−1
.
N
2
< He < Ar: the order of energy efficiency for CHF
3
decomposition among these gas discharges.</description><identifier>ISSN: 2046-2069</identifier><identifier>EISSN: 2046-2069</identifier><identifier>DOI: 10.1039/c6ra01485b</identifier><language>eng</language><subject>Barometric pressure ; Decomposition ; Dielectric barrier discharge ; Dilution ; Discharge ; Flow rate ; Power efficiency ; Trifluoromethane</subject><ispartof>RSC advances, 2016-01, Vol.6 (32), p.2655-26513</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c286t-ec3a77aac570c822d14db9b8d4ca0ecd478b5dc228478e0f9c89ccc33e2e1f4f3</citedby><cites>FETCH-LOGICAL-c286t-ec3a77aac570c822d14db9b8d4ca0ecd478b5dc228478e0f9c89ccc33e2e1f4f3</cites><orcidid>0000-0002-5018-6531</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Nguyen, D. B</creatorcontrib><creatorcontrib>Lee, W. G</creatorcontrib><title>Effects of ambient gas on cold atmospheric plasma discharge in the decomposition of trifluoromethane</title><title>RSC advances</title><description>The effect of dilution gases (He, Ar and N
2
) on plasma discharge in the decomposition of trifluoromethane (CHF
3
) was investigated in dielectric barrier discharge at atmospheric pressure. A comparison among these dilution gases was performed in terms of active power, apparent power, power factor, impedance, and power efficiency for the decomposition of CHF
3
. He dilution showed the most homogeneous and stable discharge among the dilution gases. However, Ar dilution ignited the generation of streamers in the plasma discharge, resulting in a relatively superior power efficiency in CHF
3
decomposition. In addition, due to the plasma reactions between O
2
and N
2
, N
2
as a dilution gas had a disadvantaging tendency to form nitric oxide compounds (harmful compounds). Complete decomposition of CHF
3
could be performed under the following conditions; Ar dilution, active power ≥ 40 W, a CHF
3
fraction of 0.2% and a total flow rate of 1000 ml min
−1
.
N
2
< He < Ar: the order of energy efficiency for CHF
3
decomposition among these gas discharges.</description><subject>Barometric pressure</subject><subject>Decomposition</subject><subject>Dielectric barrier discharge</subject><subject>Dilution</subject><subject>Discharge</subject><subject>Flow rate</subject><subject>Power efficiency</subject><subject>Trifluoromethane</subject><issn>2046-2069</issn><issn>2046-2069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNpNkM1LxDAQxYsouKx78S7kKEI1SdM0Pa7L-gELgui5pJPJttJuapI9-N8bXVHnMm_gN4_Hy7JzRq8ZLeobkF5TJlTZHmUzToXMOZX18T99mi1CeKNpZMm4ZLPMrK1FiIE4S_TY9riLZKvTuSPgBkN0HF2YOvQ9kGnQYdTE9AE67bdI-h2JHRKD4MbJhT726S0ZRd_bYe-8GzF2eodn2YnVQ8DFz55nr3frl9VDvnm6f1wtNzlwJWOOUOiq0hrKioLi3DBh2rpVRoCmCEZUqi0NcK6SQmprUDUAFAVyZFbYYp5dHnwn7973GGIzpqw4DCmD24eGKUpFJZSQCb06oOBdCB5tM_l-1P6jYbT5arNZyefld5u3Cb44wD7AL_fXdvEJ-hRzbA</recordid><startdate>20160101</startdate><enddate>20160101</enddate><creator>Nguyen, D. B</creator><creator>Lee, W. G</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><orcidid>https://orcid.org/0000-0002-5018-6531</orcidid></search><sort><creationdate>20160101</creationdate><title>Effects of ambient gas on cold atmospheric plasma discharge in the decomposition of trifluoromethane</title><author>Nguyen, D. B ; Lee, W. G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c286t-ec3a77aac570c822d14db9b8d4ca0ecd478b5dc228478e0f9c89ccc33e2e1f4f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>Barometric pressure</topic><topic>Decomposition</topic><topic>Dielectric barrier discharge</topic><topic>Dilution</topic><topic>Discharge</topic><topic>Flow rate</topic><topic>Power efficiency</topic><topic>Trifluoromethane</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Nguyen, D. B</creatorcontrib><creatorcontrib>Lee, W. G</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>RSC advances</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Nguyen, D. B</au><au>Lee, W. G</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of ambient gas on cold atmospheric plasma discharge in the decomposition of trifluoromethane</atitle><jtitle>RSC advances</jtitle><date>2016-01-01</date><risdate>2016</risdate><volume>6</volume><issue>32</issue><spage>2655</spage><epage>26513</epage><pages>2655-26513</pages><issn>2046-2069</issn><eissn>2046-2069</eissn><abstract>The effect of dilution gases (He, Ar and N
2
) on plasma discharge in the decomposition of trifluoromethane (CHF
3
) was investigated in dielectric barrier discharge at atmospheric pressure. A comparison among these dilution gases was performed in terms of active power, apparent power, power factor, impedance, and power efficiency for the decomposition of CHF
3
. He dilution showed the most homogeneous and stable discharge among the dilution gases. However, Ar dilution ignited the generation of streamers in the plasma discharge, resulting in a relatively superior power efficiency in CHF
3
decomposition. In addition, due to the plasma reactions between O
2
and N
2
, N
2
as a dilution gas had a disadvantaging tendency to form nitric oxide compounds (harmful compounds). Complete decomposition of CHF
3
could be performed under the following conditions; Ar dilution, active power ≥ 40 W, a CHF
3
fraction of 0.2% and a total flow rate of 1000 ml min
−1
.
N
2
< He < Ar: the order of energy efficiency for CHF
3
decomposition among these gas discharges.</abstract><doi>10.1039/c6ra01485b</doi><tpages>9</tpages><orcidid>https://orcid.org/0000-0002-5018-6531</orcidid></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 2046-2069 |
| ispartof | RSC advances, 2016-01, Vol.6 (32), p.2655-26513 |
| issn | 2046-2069 2046-2069 |
| language | eng |
| recordid | cdi_crossref_primary_10_1039_C6RA01485B |
| source | Royal Society Of Chemistry Journals 2008- |
| subjects | Barometric pressure Decomposition Dielectric barrier discharge Dilution Discharge Flow rate Power efficiency Trifluoromethane |
| title | Effects of ambient gas on cold atmospheric plasma discharge in the decomposition of trifluoromethane |
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