Improved cut-resistance of Kevlar® using controlled interface reactions during atomic layer deposition of ultrathin (<50 Å) inorganic coatings
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| Veröffentlicht in: | Journal of materials chemistry. A, Materials for energy and sustainability Materials for energy and sustainability, 2014-11, Vol.2 (41), p.17371-17379 |
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| Format: | Artikel |
| Sprache: | eng |
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| container_end_page | 17379 |
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| container_issue | 41 |
| container_start_page | 17371 |
| container_title | Journal of materials chemistry. A, Materials for energy and sustainability |
| container_volume | 2 |
| creator | Atanasov, Sarah E. Oldham, Christopher J. Slusarski, Kyle A. Taggart-Scarff, Joshua Sherman, Shalli A. Senecal, Kris J. Filocamo, Shaun F. McAllister, Quinn P. Wetzel, Eric D. Parsons, Gregory N. |
| description | |
| doi_str_mv | 10.1039/C4TA03662J |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 2050-7488 |
| ispartof | Journal of materials chemistry. A, Materials for energy and sustainability, 2014-11, Vol.2 (41), p.17371-17379 |
| issn | 2050-7488 2050-7496 |
| language | eng |
| recordid | cdi_crossref_primary_10_1039_C4TA03662J |
| source | Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection |
| title | Improved cut-resistance of Kevlar® using controlled interface reactions during atomic layer deposition of ultrathin (<50 Å) inorganic coatings |
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