Generally Applicable Self-Masked Dry Etching Technique for Nanotip Array Fabrication

Well-aligned nanotip arrays were fabricated by electron cyclotron resonance (ECR) plasma process using gas mixtures of silane, methane, argon, and hydrogen. The resultant tips have nanoscale apexes (∼1 nm) with high aspect ratios (∼50), which were achieved by simultaneous SiC nanomask formation and...

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Veröffentlicht in:Nano letters 2004-03, Vol.4 (3), p.471-475
Hauptverfasser: Hsu, Chih-Hsun, Lo, Hung-Chun, Chen, Chia-Fu, Wu, Chien Ting, Hwang, Jih-Shang, Das, Debajyoti, Tsai, Jeff, Chen, Li-Chyong, Chen, Kuei-Hsien
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Sprache:eng
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